Richard K Pham, 43522 Bonair St, La Jolla, CA 92037

8040068, Oct 18, 2011

Feb 5, 2009

12/366274

David J. Coumou - Webster NY, US
Paul Eyerman - Penfield NY, US
Carl Ioriatti - Victor NY, US
William Stenglein - Churchville NY, US
Aaron Radomski - Wyoming NY, US
Richard Pham - San Jose CA, US

MKS Instruments, Inc. - Andover MA

H05H 1/46
H01J 37/32

31511121, 31511141

A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1.

2013022, Aug 29, 2013

Feb 23, 2012

13/403656

David J. Coumou - Webster NY, US
Richard Pham - San Jose CA, US

MKS INSTRUMENTS, INC. - Andover MA

H03F 1/00

330 75

A RF power supply system for delivering periodic RF power to a load. A power amplifier outputs a RF signal to the load. A sensor measures the RF signal provided to the load and outputs signals that vary in accordance with the RF signal. A first feedback loop enables control the RF signal based upon power determined in accordance with output from the sensor. A second feedback loop enables control the RF signal based upon energy measured in accordance with signals output from the sensor. Energy amplitude and duration provide control values for varying the RF signal. The control system and techniques are applicable to both pulsed RF power supplies and in various instances to continuous wave power supplies.

2014006, Mar 6, 2014

Mar 14, 2013

13/826571

Richard PHAM - San Jose CA, US

MKS INSTRUMENTS, INC. - Andover MA

G01R 31/00
H01J 37/32

31511121, 324537

A system includes a control module, a detection module, and a reaction module. The control module is configured to receive a sensor signal indicating a power characteristic of an output power provided from a power generator to a load. The load is separate from the control module and the power generator. The detection module is configured to (i) detect a shift parameter of the power characteristic based on the sensor signal, (ii) compare the shift parameter to a first threshold, and (iii) indicate whether the shift parameter has exceeded the first threshold and not a second threshold. The reaction module is configured to indicate that a low-level abnormality exists in the load in response to the shift parameter exceeding the first threshold and not the second threshold.

2019033, Oct 31, 2019

Jul 11, 2019

16/509088

- Andover MA, US
Ross REINHARDT - Rochester NY, US
Yuriy ELNER - Pittsford NY, US
Daniel M. GILL - Macedon NY, US
Richard PHAM - San Jose CA, US

MKS Instruments, Inc. - Andover MA

H01J 37/32

A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives the frequency and phase signal and also receives signals characteristic of the spectral emissions detected from the load. The slave RF power supply varies the phase and power of its RF output signal applied to the load. Varying the power controls the width of an ion distribution function, and varying the phase controls a peak of the ion distribution. Depending upon the coupling between the RF generators and the load, different spectral emissions are detected, including first harmonics, second harmonics, and, in the case of a dual frequency drive system, intermodulation distortion.

2017006, Mar 2, 2017

Aug 27, 2015

14/837512

- Andover MA, US
Ross REINHARDT - Rochester NY, US
Yuiry ELNER - Pittsford NY, US
Daniel M. GILL - Macedon NY, US
Richard PHAM - San Jose CA, US

H01J 37/32

A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives the frequency and phase signal and also receives signals characteristic of the spectral emissions detected from the load. The slave RF power supply varies the phase and power of its RF output signal applied to the load. Varying the power controls the width of an ion distribution function, and varying the phase controls a peak of the ion distribution. Depending upon the coupling between the RF generators and the load, different spectral emissions are detected, including first harmonics, second harmonics, and, in the case of a dual frequency drive system, intermodulation distortion.

2014030, Oct 16, 2014

Jul 7, 2014

14/324540

- Andover MA, US
Richard PHAM - San Jose CA, US

H03G 1/00
H03F 3/189
H03F 3/20
H03F 1/56

330103

A RF power supply system for delivering periodic RF power to a load. A power amplifier outputs a RF signal to the load. A sensor measures the RF signal provided to the load and outputs signals that vary in accordance with the RF signal. A first feedback loop enables control the RF signal based upon power determined in accordance with output from the sensor. A second feedback loop enables control the RF signal based upon energy measured in accordance with signals output from the sensor. Energy amplitude and duration provide control values for varying the RF signal. The control system and techniques are applicable to both pulsed RF power supplies and in various instances to continuous wave power supplies.