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Roger A Mckay, 64Portland, OR

Roger Mckay Phones & Addresses

Portland, OR   

2919 Davidson St, Albany, OR 97322    541-9670549   

Corvallis, OR   

2919 Davidson St SE, Albany, OR 97322   

Mentions for Roger A Mckay

Roger Mckay resumes & CV records

Resumes

Roger Mckay Photo 40

Producer / Voice And Acting Coach

Position:
Voice and Acting Coach at Kirk's Studio for the Performing Arts, Producer at The Don Bluth Front Row Theatre
Location:
Scottsdale, Arizona
Industry:
Entertainment
Work:
Kirk's Studio for the Performing Arts - Scottsdale, AZ since Feb 2006
Voice and Acting Coach
The Don Bluth Front Row Theatre - Scottsdale, AZ since Feb 2005
Producer
Pinnacle Aviation Mar 2011 - Sep 2011
Director of Marketing
Cutter Aviation Jun 2006 - Jan 2011
Regional Sales Manager
America West Airlines 1984 - 2003
Strategic Sales
Education:
University of Nevada-Las Vegas
Bachelors, Broadcast Journalism & Political Science
Roger Mckay Photo 41

Roger Mckay

Location:
United States
Roger Mckay Photo 42

Engineer At Hewlett-Packard

Location:
Corvallis, Oregon Area
Industry:
Printing
Roger Mckay Photo 43

Roger Mckay

Location:
United States
Roger Mckay Photo 44

Roger Mckay

Location:
United States

Publications & IP owners

Us Patents

Substrate Etch

US Patent:
2016020, Jul 21, 2016
Filed:
Aug 30, 2013
Appl. No.:
14/914068
Inventors:
- Houston TX, US
Roger A. McKay Jr - Corvallis OR, US
Assignee:
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. - Houston TX
International Classification:
C25F 3/12
C25F 3/14
C25F 7/00
B81C 1/00
Abstract:
An example provides a method including sputtering a metal catalyst onto a substrate, exposing the substrate to a solution that reacts with the metal catalyst to form a plurality of pores in the substrate, and etching the substrate to remove the plurality of pores to form a recess in the substrate.

Substrate Etch

US Patent:
2016020, Jul 14, 2016
Filed:
Aug 30, 2013
Appl. No.:
14/914215
Inventors:
- Houston TX, US
Roger A. McKay - Corvallis OR, US
Assignee:
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. - Houston TX
International Classification:
B81C 1/00
B41J 2/16
Abstract:
An example provides a method including sputtering a metal catalyst onto a substrate, exposing the substrate to a solution that reacts with the metal catalyst to form a plurality of pores in the substrate, and etching the substrate to remove the plurality of pores to form a recess in the substrate.

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