Somnath Banerjee resumes & CV records
Resumes
Somnath Banerjee
Somnath Banerjee
Location:
United States
Somnath Banerjee
Location:
United States
Somnath S Banerjee, 542609 Woodside Cir, Mckinney, TX 75072
Somnath Banerjee Phones & Addresses
2609 Woodside Cir, McKinney, TX 75072 972-5423797
2908 Cheverny Dr, Mc Kinney, TX 75070 972-5423797
42479 Northville Place Dr, Northville, MI 48167 248-3491387
Rochester, NY
Laurel, MD
Cuero, TX
Spring Branch, TX
Farmington Hills, MI
Mentions for Somnath S Banerjee
Publications & IP owners
Us Patents
Apparatus And Method For Determining Wafer Temperature Using Pyrometry
US Patent:
5305417, Apr 19, 1994
Filed:
Mar 26, 1993
Appl. No.:
8/037771
Inventors:
Habib N. Najm - Dallas TX
Mehrdad M. Moslehi - Dallas TX
Somnath Banerjee - Dallas TX
Lino A. Velo - Dallas TX
Mehrdad M. Moslehi - Dallas TX
Somnath Banerjee - Dallas TX
Lino A. Velo - Dallas TX
Assignee:
Texas Instruments Incorporated - Dallas TX
International Classification:
G01J 506
US Classification:
392418
Abstract:
In a RTP reactor where wafer temperature is measured by a pyrometer assembly (32), a pyrometer assembly (50) is further provided to measure the temperature of the quartz window (30) that is situated between the wafer pyrometer assembly (32) and the wafer (16) that is being processed. During the calibration procedure (100, 120) where a thermocouple wafer is used, the measurements from the wafer pyrometer assembly (32) and the window pyrometer assembly (50) are calibrated, and pyrometer measurements and thermocouple measurements are collected and compiled into calibration tables. During actual RTP reactor operation, the data from the calibration tables and current wafer and window pyrometer measurements are used to compute corrected wafer temperature(s). The corrected wafer temperature(s) is/are then used to control the intensities of the heating lamps according to the wafer processing heating schedule.
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