Shiyu Gao Zheng Zhang, 5847521 Kinner Fls Cmn, Fremont, CA 94539
Shiyu Zhang Phones & Addresses
3500 Mill Creek Rd, Fremont, CA 94539
30190 Bridgeview Way, Hayward, CA 94544 510-4758722
Bay Point, CA
Beaverton, OR
Union City, CA
Tucson, AZ
Redwood City, CA
North Las Vegas, NV
Mentions for Shiyu Gao Zheng Zhang
Publications & IP owners
Us Patents
Visual Field Tester
US Patent:
6422701, Jul 23, 2002
Filed:
Aug 10, 2001
Appl. No.:
09/928164
Inventors:
Jay Wei - Fremont CA
Shiyu Zhang - Hayward CA
Shiyu Zhang - Hayward CA
Assignee:
Carl Zeiss, Inc. - Thornwood NY
International Classification:
A61B 302
US Classification:
351243
Abstract:
One embodiment of the present invention is a visual field tester that includes: (a) a high intensity light source; (b) an optical fiber; (c) scanning optics, wherein light output from the light source is directed by the optical fiber to impinge upon the scanning optics, and the scanning optics directs the light to form a stimulus at various field positions; and (d) a video display system to output one or more light patterns. Another embodiment of the present invention is a visual field tester that includes: (a) a video display system to output one or more types of light patterns; (b) a background illumination display system; and (c) viewing optics to magnify the field of view of the video display system and the background illumination display system. Still another embodiment of the present invention is a visual field tester that includes: (a) a video display system to output one or more types of light patterns; and (b) a background illumination display system that outputs variable intensity light, wherein the video display system includes: (i) a variable intensity, high brightness light source and (ii) a light modulator display disposed to transmit light output from the source.
Deep Ultraviolet Unit-Magnification Projection Optical System And Projection Exposure Apparatus
US Patent:
6863403, Mar 8, 2005
Filed:
May 27, 2003
Appl. No.:
10/447128
Inventors:
Romeo I. Mercado - Fremont CA, US
Shiyu Zhang - Hayward CA, US
Shiyu Zhang - Hayward CA, US
Assignee:
Ultratech, Inc. - San Jose CA
International Classification:
G03B021/14
G03B027/54
G02B013/14
G02B027/28
G02B017/00
G03B027/54
G02B013/14
G02B027/28
G02B017/00
US Classification:
353 97, 353 81, 359355, 359487, 359730, 359773, 359364, 355 67
Abstract:
A 1X projection optical system for deep ultra-violet (DUV) photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a relatively large field at high numerical apertures at DUV wavelengths. The optical system includes a lens group having first and second prisms and four lenses having a positive-negative-positive negative arrangement as arranged in order from the prisms toward the mirror. A projection photolithography system that employs the projection optical system of the invention is also disclosed.
Deep Ultraviolet Unit-Magnification Projection Optical System And Projection Exposure Apparatus
US Patent:
7177099, Feb 13, 2007
Filed:
Feb 7, 2005
Appl. No.:
11/052239
Inventors:
Romeo I. Mercado - Fremont CA, US
Shiyu Zhang - Hayward CA, US
Shiyu Zhang - Hayward CA, US
Assignee:
Ultratech, Inc. - San Jose CA
International Classification:
G02B 27/10
G02B 9/34
G03B 27/54
G02B 9/34
G03B 27/54
US Classification:
359726, 359773, 355 67
Abstract:
A 1× projection optical system for deep ultra-violet (DUV) photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a relatively large field at high numerical apertures at DUV wavelengths. The optical system includes a lens group having first and second prisms and four lenses having a positive-negative-positive negative arrangement as arranged in order from the prisms toward the mirror. A projection photolithography system that employs the projection optical system of the invention is also disclosed.
Methods And Apparatus For Truncating An Image Formed With Coherent Radiation
US Patent:
7253376, Aug 7, 2007
Filed:
Jan 21, 2005
Appl. No.:
11/040739
Inventors:
Shiyu Zhang - Hayward CA, US
Igor Landau - Palo Alto CA, US
Arnold Lungershausen - Fremont CA, US
David A. Markle - Saratoga CA, US
Casey Donaher - Westford MA, US
Igor Landau - Palo Alto CA, US
Arnold Lungershausen - Fremont CA, US
David A. Markle - Saratoga CA, US
Casey Donaher - Westford MA, US
Assignee:
Ultratech, Inc. - San Jose CA
International Classification:
B23K 26/06
US Classification:
21912173, 21912165, 21912166, 21912174
Abstract:
Methods and apparatus for truncating an image formed with coherent radiation. The optical relay system is adapted to form a line image at the image plane. The image is truncated by a variable aperture at or near the aperture plane conjugate to the image plane, to block progressively increasing portions of an incident coherent radiation beam used to form the line image. An apodizing pupil filter having a maximum transmission or reflection in the center and a transmission or reflection profile that varies with direction corresponding to long direction of the line image is provided in the pupil plane. The apodization is designed to prevent hot-spots from forming in the truncated image and ensures a relatively smooth, flat intensity profile. Thus, one end or another of a coherent line image scanned over a substrate can be truncated during scanning without substantially changing the image intensity extending into the product area.
Substrate-Alignment Using Detector Of Substrate Material
US Patent:
7751067, Jul 6, 2010
Filed:
May 24, 2007
Appl. No.:
11/805826
Inventors:
Emily True - Pleasanton CA, US
Ray Ellis - Fremont CA, US
Shiyu Zhang - Hayward CA, US
Ray Ellis - Fremont CA, US
Shiyu Zhang - Hayward CA, US
Assignee:
Ultratech, Inc. - San Jose CA
International Classification:
G01B 11/14
G01B 11/00
G01B 11/00
US Classification:
356614, 356399, 356400
Abstract:
Methods and apparatuses are provided for positioning a substrate having a target that may be located on either the front-side or the backside of the substrate. The optical detector that views the target contains a signal-generating material that is substantially identical to the substrate material.
Processing Substrates Using Direct And Recycled Radiation
US Patent:
7947968, May 24, 2011
Filed:
Jan 29, 2009
Appl. No.:
12/322096
Inventors:
David A. Markle - Saratoga CA, US
Shiyu Zhang - Hayward CA, US
Shiyu Zhang - Hayward CA, US
Assignee:
Ultratech, Inc. - San Jose CA
International Classification:
G01N 21/00
B23K 26/06
G03B 27/72
B23K 26/06
G03B 27/72
US Classification:
2504922, 2504921, 355 45, 430298, 372101, 372 3802
Abstract:
Provided are apparatuses for processing a surface of a substrate using direct and recycled radiation reflected from the substrate. The apparatus includes a radiation source positioned to direct a radiation beam toward a beam image forming system that forms a beam image on the substrate surface and a recycling system. The recycling system collects radiation reflected from the substrate surface and redirects it back toward the beam image on the substrate in a +1× manner. As a result, radiation incident on and reflected from the substrate is recycled through multiple cycles. This improves the uniformity of the radiation absorbed by the substrate in instances where the thin film patterns on the substrate would otherwise result in non-uniform absorption and uneven heating. Exemplary recycling systems suitable for use with the invention include Offner and Dyson relay systems as well as variants thereof.
Substrate-Alignment Using Detector Of Substrate Material
US Patent:
RE44116, Apr 2, 2013
Filed:
Feb 3, 2012
Appl. No.:
13/366199
Inventors:
Emily True - San Ramon CA, US
Ray Ellis - Aptos CA, US
Shiyu Zhang - Hayward CA, US
Ray Ellis - Aptos CA, US
Shiyu Zhang - Hayward CA, US
Assignee:
Ultratech, Inc. - San Jose CA
International Classification:
G01B 11/14
G01B 11/00
G01B 11/00
US Classification:
356614, 356399, 356400
Abstract:
Methods and apparatuses are provided for positioning a substrate having a target that may be located on either the front-side or the backside of the substrate. The optical detector that views the target contains a signal-generating material that is substantially identical to the substrate material.
Automatic Garage Door Controlling Apparatus And Methods
US Patent:
2003017, Sep 18, 2003
Filed:
Mar 14, 2002
Appl. No.:
10/097948
Inventors:
Shiyu Zhang - Hayward CA, US
International Classification:
H04Q001/00
G05B019/00
G05B019/00
US Classification:
340/005640, 340/005710
Abstract:
An automatic garage door status signaling apparatus comprises a push button, a garage door opening and closing circuitry, a signal indicating circuitry, and a delay timer control circuitry is provided. An indicating signal is generated if the push button is not pressed within a predetermined time period after the delay timer control circuitry is activated. An automatic garage door status indicating apparatus comprises a push button, a garage door opening and closing circuitry and a garage door status indicating circuitry is also provided. In one embodiment, the garage door status indicating circuitry comprises a time log. In another embodiment, the garage door status indicating circuitry comprises a timer, which can be a clock.
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