Stephen Charles Hsu, 642825 Roland Ave, San Carlos, CA 94070

6393163, May 21, 2002

Dec 2, 1999

09/453749

Peter J. Burt - Princeton NJ
Michal Irani - Princeton Junction NJ
Stephen Charles Hsu - East Windsor NJ
Padmanabhan Anandan - Lawrenceville NJ
Michael W. Hansen - New Hope PA

Sarnoff Corporation - Princeton NJ

G06K 936

382294, 382284

A system for automatically generating a mosaic from a plurality of input images. The system sequentially executes an image alignment process, an editing process, and a combining process such that, from a sequence of images, the system automatically produces a seamless mosaic for various applications. Illustrative applications for the mosaic include: (1) a mosaic based display system including an image printing system, (2) a surveillance system and (3) a mosaic based compression system. The mosaic based display system permits a system user to display, manipulate and alter a mosaic. The mosaic based compression system exploits the temporal and spatial redundancy in image sequences and efficiently compresses the image information. The compression system can be used for compressing image information for storage in a storage device or can be used for compressing image information for transmission through a band-limited transmission channel. The surveillance system combines the mosaic construction system, the compression system and the display system into a comprehensive system for remote motion detection.

6512857, Jan 28, 2003

May 8, 1998

09/075462

Stephen Charles Hsu - Cranbury NJ
Rakesh Kumar - Monmouth Junction NJ
Harpreet Singh Sawhney - Cranbury NJ
Jane Asmuth - Princeton NJ

Sarnoff Corporation - Princeton NJ

G06K 932

382294, 382295, 382296

A system and method for accurately mapping between camera coordinates and geo-coordinates, called geo-spatial registration. The system utilizes the imagery and terrain information contained in the geo-spatial database to precisely align geographically calibrated reference imagery with an input image, e. g. , dynamically generated video images, and thus achieve a high accuracy identification of locations within the scene. When a sensor, such as a video camera, images a scene contained in the geo-spatial database, the system recalls a reference image pertaining to the imaged scene. This reference image is aligned very accurately with the sensors images using a parametric transformation. Thereafter, other information that is associated with the reference image can easily be overlaid upon or otherwise associated with the sensor imagery.

6519760, Feb 11, 2003

Apr 24, 2001

09/840305

Xuelong Shi - San Jose CA
Jang Fung Chen - Cupertino CA
Stephen Hsu - Fremont CA

ASML Masktools, B.V. - Veldhoven

G06F 1750

716 19, 716 21

Optical proximity effects (OPEs) are a well-known phenomenon in photolithography. OPEs result from the structural interaction between the main feature and neighboring features. It has been determined by the present inventors that such structural interactions not only affect the critical dimension of the main feature at the image plane, but also the process latitude of the main feature. Moreover, it has been determined that the variation of the critical dimension as well as the process latitude of the main feature is a direct consequence of light field interference between the main feature and the neighboring features. Depending on the phase of the field produced by the neighboring features, the main feature critical dimension and process latitude can be improved by constructive light field interference, or degraded by destructive light field interference. The phase of the field produced by the neighboring features is dependent on the pitch as well as the illumination angle. For a given illumination, the forbidden pitch region is the location where the field produced by the neighboring features interferes with the field of the main feature destructively.

6587601, Jul 1, 2003

Jun 28, 2000

09/605915

Stephen Charles Hsu - East Windsor NJ
Supun Samarasekera - Princeton NJ

Sarnoff Corporation - Princeton NJ

G06K 932

382294, 707100, 382154

A system and method for accurately mapping between camera coordinates and geo-coordinates, called geo-spatial registration, using a Euclidean model. The system utilizes the imagery and terrain information contained in the geo-spatial database to precisely align geographically calibrated reference imagery with an input image, e. g. , dynamically generated video images, and thus achieve a high accuracy identification of locations within the scene. When a sensor, such as a video camera, images a scene contained in the geo-spatial database, the system recalls a reference image pertaining to the imaged scene. This reference image is aligned very accurately with the sensors images using a parametric transformation produced by a Euclidean model. Thereafter, other information that is associated with the reference image can easily be overlaid upon or otherwise associated with the sensor imagery.

6597818, Jul 22, 2003

Mar 9, 2001

09/803700

Rakesh Kumar - Monmouth Junction NJ
Stephen Charles Hsu - Cranbury NJ
Keith Hanna - Princeton NJ
Supun Samarasekera - Princeton NJ
Richard Patrick Wildes - Princeton NJ
David James Hirvonen - Princeton NJ
Thomas Edward Klinedinst - Doylestown PA
William Brian Lehman - Mount Holly NJ
Bodgan Matei - Piscataway NJ
Wenyi Zhao - Plainsboro NJ

Sarnoff Corporation - Princeton NJ

G06K 932

382294, 382284, 382305, 707102

A system and method for accurately mapping between image coordinates and geo-coordinates, called geo-spatial registration. The system utilizes the imagery and terrain information contained in the geo-spatial database to precisely align geodetically calibrated reference imagery with an input image, e. g. , dynamically generated video images, and thus achieve a high accuracy identification of locations within the scene. When a sensor, such as a video camera, images a scene contained in the geo-spatial database, the system recalls a reference image pertaining to the imaged scene. This reference image is aligned very accurately with the sensors images using a parametric transformation. Thereafter, other information that is associated with the reference image can easily be overlaid upon or otherwise associated with the sensor imagery.

6851103, Feb 1, 2005

Mar 25, 2003

10/395903

Doug Van Den Broeke - Sunnyvale CA, US
Jang Fung Chen - Cupertino CA, US
Thomas Laidig - Point Richmond CA, US
Kurt E. Wampler - Sunnyvale CA, US
Stephen Hsu - Fremont CA, US

ASML Masktools, B.V. - Veldhoven

G06F 1750
G06F 1900
G03F 900
G21K 500

716 21, 700120, 700121, 378 35, 430 5, 25049223

A method of generating a mask of use in printing a target pattern on a substrate. The method includes the steps of (a) determining a maximum width of features to be imaged on the substrate utilizing phase-structures formed in the mask; (b) identifying all features contained in the target pattern having a width which is equal to or less than the maximum width; (c) extracting all features having a width which is equal to or less than the maximum width from the target pattern; (d) forming phase-structures in the mask corresponding to all features identified in step (b); and (e) forming opaque structures in the mask for all features remaining in target pattern after performing step (c).

6915505, Jul 5, 2005

Mar 25, 2003

10/395888

Stephen D. Hsu - Fremont CA, US
Noel Corcoran - San Jose CA, US
Jang Fung Chen - Cupertino CA, US

ASML Masktools B.V. - Veldhoven

G06F017/50

716 19, 716 20, 716 21

A method of printing a gate pattern on a substrate comprising the steps of: identifying at least one area in the pattern in which one of the gate features overlays one of the active regions; reducing a width dimension of the one of the gate features at the location which the one of the gate features overlays the one of the active regions; extracting the gate features from the pattern; decomposing the gate features into a vertical component mask and a horizontal component mask; and illuminating the vertical component mask and the horizontal component mask utilizing dipole illumination.

6951701, Oct 4, 2005

Aug 19, 2002

10/222972

Michael Hsu - Taipei, TW
Stephen Hsu - Fremont CA, US
Thomas Laidig - Point Richmond CA, US
Douglas Van Den Broeke - Sunnyvale CA, US
Jang Fung Chen - Cupertino CA, US

ASML Masktools B.V. - Veldhoven

G03B027/72

430 30, 430311, 430322, 430 5, 355 71, 355 67, 716 19

A method for optically transferring a lithographic pattern corresponding to an integrated circuit utilizing a high transmission attenuated phase-shift mask onto a semiconductor substrate by use of an optical exposure tool. The method comprising the steps of generating a diffraction pattern corresponding to the lithographic pattern, where the diffraction pattern indicates a plurality of spatial frequency components corresponding to the lithographic pattern; determining which of the spatial frequency components need to be captured by a lens in the optical exposure tool in order to accurately reproduce the lithographic pattern; determining a set of illumination conditions required for the optical exposure tool to capture the spatial frequency components necessary for accurately reproducing the lithographic pattern; and illuminating the high transmission attenuated phase-shift mask with this set of illumination conditions.