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Stephen D TisdaleRio Grande, NJ

Related to:
Hadiya D Speller 31 Lynelle Tisdale 20

Stephen Tisdale Phones & Addresses

Rio Grande, NJ   

Bronx, NY   

New York, NY   

Work

Company: New york city of correction, Jul 1989 Position: Director of discharge planning for city sentence inmates

Education

School / High School: Audrey Cohen College- New York, NY Specialities: Bachelor in Professional Studies

Skills

Credentialed Alcoholism and Substance Abuse Counselor (CASAC) # 7908 Internationally Certified Alcohol &Drug Counselor # 105860
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Mentions for Stephen D Tisdale

Resumes & CV records

Resumes

Stephen Tisdale Photo 33

Clerk At Hanlon Boglioli & Hanlon P.c.

Location:
Greater New York City Area
Industry:
Law Practice
Stephen Tisdale Photo 34

Oasas

Location:
403 Heritage Ln, Monroe, NY 10950
Industry:
Law Enforcement
Work:
Nyc Correction Jul 1989 - Dec 2011
Retired Director Addiction Research & Treatment Corporation Jan 1976 - Jul 1989
Supervisor of Counselor Unit Greater New York City Area Jan 1976 - Jul 1989
Oasas
Education:
Audrey Cohen College 1985
John Jay College (Cuny) 1974 - 1979
Bachelors, Bachelor of Arts, Criminal Justice
Skills:
Staff Training, Presenter, Staff Development, Workshop Facilitation, Personal Development, Therapists
Interests:
Travelling and Networking
Writing
Road Trips
Reading
Languages:
English
Certifications:
License 7908
Casac
Stephen Tisdale Photo 35

Stephen Tisdale

Stephen Tisdale Photo 36

Filing Clerk At Goldberg Segalla Llp

Location:
Greater New York City Area
Industry:
Law Practice
Stephen Tisdale Photo 37

Stephen Tisdale - New York, NY

Work:
New York City of Correction, Jul 1989 to Present
Director of Discharge Planning for City Sentence Inmates Addiction Research and Teatment Corporation - New York, NY Jul 1976 to Jul 1989
Supervisor (Addiction Treatment)
Education:
Audrey Cohen College - New York, NY
Bachelor in Professional Studies
Skills:
Credentialed Alcoholism and Substance Abuse Counselor (CASAC) # 7908 Internationally Certified Alcohol &Drug Counselor # 105860

Publications & IP owners

Us Patents

Method For Conditioning Halogenated Polymeric Materials And Structures Fabricated Therewith

US Patent:
5800858, Sep 1, 1998
Filed:
Sep 12, 1996
Appl. No.:
8/711894
Inventors:
Harry Randall Bickford - Ossining NY
Peter J. Duke - Endwell NY
Elizabeth Foster - Friendsville PA
Martin Goldberg - San Jose CA
Voya Rista Markovich - Endwell NY
Linda Matthew - Palo Alto CA
Donald G. McBride - Binghamton NY
Terrence Robert O'Toole - Webster NY
Stephen Leo Tisdale - Endwell NY
Alfred Viehbeck - Fishkill NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
B05D 512
US Classification:
427 97
Abstract:
A halogenated polymeric material is exposed to a reducing agent and/or an electrolyte and applied voltage to render exposed portions capable of being metallized and of being etched. The exposed portions can also be doped to thereby induce electrical conductivity therein. Also, new structures containing a free standing halogenated polymeric-containing layer and electrical conductive pattern thereon are provided.

Toughened Photosensitive Polycyanurate Resist, And Structure Made Therefrom And Process Of Making

US Patent:
5919596, Jul 6, 1999
Filed:
Feb 11, 1997
Appl. No.:
8/798592
Inventors:
Jeffrey C. Hedrick - Park Ridge NJ
Konstantinos Papathomas - Endicott NY
Stephen L. Tisdale - Hopewell Junction NY
Alfred Viehbeck - Fishkill NY
Jeffrey D. Gelorme - Plainville CT
Voya Rista Markovich - Endwell NY
Thomas H. Lewis - Apalachin NY
Stephen Joseph Fuerniss - Endicott NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G03F 726
US Classification:
4302701
Abstract:
Disclosed is an admixture which is curable to form a crack resistant, photosensitive polycyanurate resist. Also disclosed is a structure for its use and process of making. The resist can be tailored to be either positively or negatively sensitive to actinic radiation. Because of its improved thermal and mechanical properties, the cured resist is suitable for use at high temperature, such as in electronic packaging applications.

Fluorinated Carbon Polymer Composites

US Patent:
5591285, Jan 7, 1997
Filed:
Jul 24, 1995
Appl. No.:
8/475670
Inventors:
Bodil E. Braren - Hartsdale NY
Shahrokh Daijavad - Peekskill NY
Elizabeth Foster - Friendsville PA
James L. Hedrick - Oakland CA
Jeffrey C. Hedrick - Peekskill NY
Rodney T. Hodgson - Ossining NY
Ashit A. Mehta - Vestal NY
Steven E. Molis - Brewster NY
Jane M. Shaw - Ridgefield CT
Stephen L. Tisdale - Vestal NY
Alfred Viehbeck - Fishkill NY
Assignee:
International Business Machines Corp. - Armonk NY
International Classification:
B32B 3128
B32B 2716
US Classification:
156 622
Abstract:
Disclosed are structures comprising a composite of fluorinated particulate carbon dispersed in a polymer, the fluorinated carbon being present in an amount sufficient to reduce the dielectric constant of the composition, the structure also including electrical conductor patterns. The composite can be made conductive by irradiating it with an UV excimer laser.

Fluorinated Carbon Polymer Composites

US Patent:
5397863, Mar 14, 1995
Filed:
Aug 13, 1992
Appl. No.:
7/929313
Inventors:
Bodil E. Braren - Hartsdale NY
Shahrokh Daijavad - Peekskill NY
Elizabeth Foster - Friendsville PA
James L. Hedrick - Oakland CA
Jeffrey C. Hedrick - Peekskill NY
Rodney T. Hodgson - Ossining NY
Ashit A. Mehta - Vestal NY
Steven E. Molis - Brewster NY
Jane M. Shaw - Ridgefield CT
Stephen L. Tisdale - Vestal NY
Alfred Viehbeck - Fishkill NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
H05K 103
US Classification:
174258
Abstract:
Disclosed are structures comprising a composite of fluorinated particulate carbon dispersed in a polymer, the fluorinated carbon being present in an amount sufficient to reduce the dielectric constant of the composition, the structure also including electrical conductor patterns. The composite can be made conductive by irradiating it with an UV excimer laser.

Fluorinated Carbon Polymer Composites

US Patent:
5571852, Nov 5, 1996
Filed:
Jun 7, 1995
Appl. No.:
8/472120
Inventors:
Bodil E. Braren - Hartsdale NY
Shahrokh Daijavad - Peekskill NY
Elizabeth Foster - Friendsville PA
James L. Hedrick - Oakland CA
Jeffrey C. Hedrick - Peekskill NY
Rodney T. Hodgson - Ossining NY
Ashit A. Mehta - Vestal NY
Steven E. Molis - Brewster NY
Jane M. Shaw - Ridgefield CT
Stephen L. Tisdale - Vestal NY
Alfred Viehbeck - Fishkill NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
C08J 328
US Classification:
523215
Abstract:
Disclosed are structures comprising a composite of fluorinated particulate carbon dispersed in a polymer, the fluorinated carbon being present in an amount sufficient to reduce the dielectric constant of the composition, the structure also including electrical conductor patterns. The composite can be made conductive by irradiating it with an UV excimer laser.

Method For Conditioning Halogenated Polymeric Materials And Structures Fabricated Therewith

US Patent:
5374454, Dec 20, 1994
Filed:
Feb 4, 1993
Appl. No.:
8/013652
Inventors:
Harry R. Bickford - Ossining NY
Peter J. Duke - Endwell NY
Elizabeth Foster - Friendsville PA
Martin J. Goldberg - Mahopac NY
Voya R. Markovich - Endwell NY
Linda C. Matthew - Peekskill NY
Donald G. McBride - Binghampton NY
Terrence R. O'Toole - Hopewell Junction NY
Stephen L. Tisdale - Vestal NY
Alfred Viehbeck - Stormville NY
Assignee:
International Business Machines Incorporated - Armonk NY
International Classification:
B05D 100
US Classification:
427306
Abstract:
A halogenated polymeric material is exposed to a reducing agent and/or an electrolyte and applied voltage to render exposed portions capable of being metallized and of being etched. The exposed portions can also be doped to thereby induce electrical conductivity therein. Also, new structures containing a free standing halogenated polymeric-containing layer and electrical conductive pattern thereon are provided.

Conditioning Of A Substrate For Electroless Plating Thereon

US Patent:
5318803, Jun 7, 1994
Filed:
Nov 13, 1990
Appl. No.:
7/614669
Inventors:
Harry R. Bickford - Ossining NY
Dennis A. Canfield - Montrose PA
Arthur E. Graham - Lexington KY
Stephen L. Tisdale - Vestal NY
Alfred Viehbeck - Stormville NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
B05D 100
US Classification:
427306
Abstract:
A dielectric substrate is conditioned for subsequent electroless plating thereon by contacting with a catalytic metal salt and then with a reducing agent and with an electroless metal plating bath followed by contacting with a second catalytic metal salt. In addition, a dielectric substrate is conditioned for electroless plating thereon by obtaining a substrate of a dielectric material that contains metal particles therein and contacting with a catalytic metal salt.

Fluorinated Carbon Polymer Composites

US Patent:
5556899, Sep 17, 1996
Filed:
Nov 30, 1994
Appl. No.:
8/346766
Inventors:
Bodil E. Braren - Hartsdale NY
Shahrokh Daijavad - Peekskill NY
Elizabeth Foster - Friendsville PA
James L. Hedrick - Oakland CA
Jeffrey C. Hedrick - Peekskill NY
Rodney T. Hodgson - Ossining NY
Ashit A. Mehta - Vestal NY
Steven E. Molis - Brewster NY
Jane M. Shaw - Ridgefield CT
Stephen L. Tisdale - Vestal NY
Alfred Viehbeck - Fishkill NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
C08J 518
US Classification:
523215
Abstract:
Disclosed is a process of effecting a change in the dielectric constant and coefficient of thermal expansion of a polyimide material, by forming a composite based on a dispersion of 2-60 wt. % of fluorinated particulate carbon material and a polyimide or polyimide precursor, and heating the dispersion to about 400. degree. C. at 65. degree. -200. degree. C. /second.

Possible Relatives

Cynthia Tisdale  David G Tisdale  Dan G Tisdale  Debra J Tisdale  Daniel V Tisdale  Aaron Tisdale  Danielle A Tisdale  Stephen H Last  Stephen V Johnson  Stephen Stamps 

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