Steven Mayorga resumes & CV records
Resumes
U.s Navy
Industry:
Military
Work:
Prf7F
U.s Navy
U.s Navy
Steven G Mayorga, 633719 Via Del Rancho, Oceanside, CA 92056
Steven Mayorga Phones & Addresses
3719 Via Del Rancho, Oceanside, CA 92056 760-6311900
3576 Windrift Way, Oceanside, CA 92056
Berkeley, CA
Allentown, PA
Fontana, CA
Sun Valley, NV
San Bernardino, CA
San Diego, CA
Vista, CA
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Steven G Mayorga
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Company:
Prf7f
Position:
U.s navy
Industries
Military
Mentions for Steven G Mayorga
Publications & IP owners
Us Patents
Stabilizers To Inhibit The Polymerization Of Substituted Cyclotetrasiloxane
US Patent:
6858697, Feb 22, 2005
Filed:
Dec 21, 2001
Appl. No.:
10/029892
Inventors:
Steven Gerard Mayorga - Oceanside CA, US
Manchao Xiao - San Diego CA, US
Thomas Richard Gaffney - Carlsbad CA, US
Manchao Xiao - San Diego CA, US
Thomas Richard Gaffney - Carlsbad CA, US
Assignee:
Air Products and Chemicals, Inc. - Allentown PA
International Classification:
C07F007/21
US Classification:
528 31, 556451, 556460, 524588
Abstract:
The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing an effective amount of a neutral to weakly acidic polymerization inhibitor to such cyclotetrasiloxane; and (b) a composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, comprising; such cyclotetrasiloxane and a neutral to weakly acidic polymerization inhibitor. A free radical scavenger can also be included in the process and composition.
Stabilizers To Inhibit The Polymerization Of Substituted Cyclotetrasiloxane
US Patent:
7101948, Sep 5, 2006
Filed:
Jun 23, 2003
Appl. No.:
10/602279
Inventors:
Steven Gerard Mayorga - Oceanside CA, US
Manchao Xiao - San Diego CA, US
Thomas Richard Gaffney - Carlsbad CA, US
Robert George Syvret - Allentown PA, US
Manchao Xiao - San Diego CA, US
Thomas Richard Gaffney - Carlsbad CA, US
Robert George Syvret - Allentown PA, US
Assignee:
Air Products and Chemicals, Inc. - Allentown PA
International Classification:
C07F 7/21
US Classification:
528 31, 556451, 556460, 524588
Abstract:
The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing an effective amount of a free radical scavenger polymerization inhibitor to such cyclotetrasiloxane; and (b) a composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, comprising; such cyclotetrasiloxane and a free radical scavenger polymerization inhibitor.
Stabilizers To Inhibit The Polymerization Of Substituted Cyclotetrasiloxane
US Patent:
7300995, Nov 27, 2007
Filed:
Jul 11, 2006
Appl. No.:
11/484094
Inventors:
Steven Gerard Mayorga - Oceanside CA, US
Manchao Xiao - San Diego CA, US
Thomas Richard Gaffney - Carlsbad CA, US
Robert George Syvret - Allentown PA, US
Manchao Xiao - San Diego CA, US
Thomas Richard Gaffney - Carlsbad CA, US
Robert George Syvret - Allentown PA, US
Assignee:
Air Products and Chemicals, Inc. - Allentown PA
International Classification:
C07F 7/21
US Classification:
528 31, 556451, 556460, 524588
Abstract:
The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing an effective amount of a free radical scavenger polymerization inhibitor to such cyclotetrasiloxane; and (b) a composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, comprising; such cyclotetrasiloxane and a free radical scavenger polymerization inhibitor.
Stabilizers For The Stabilization Of Unsaturated Hydrocarbon-Based Precursor
US Patent:
7968001, Jun 28, 2011
Filed:
Feb 27, 2008
Appl. No.:
12/038409
Inventors:
Steven Gerard Mayorga - Oceanside CA, US
Kelly Ann Chandler - San Marcos CA, US
Kelly Ann Chandler - San Marcos CA, US
Assignee:
Air Products and Chemicals, Inc. - Allentown PA
International Classification:
C09K 3/00
C09K 15/00
C09K 15/16
C09K 15/22
C07D 211/00
C07D 295/00
C09K 15/00
C09K 15/16
C09K 15/22
C07D 211/00
C07D 295/00
US Classification:
25218229, 25218211, 25218212, 252397, 252401, 252403, 546184
Abstract:
A stabilized composition consists essentially of unsaturated hydrocarbon-based materials, and a stabilizer selected from the group consisting of hydroxybenzophenone and a nitroxyl radical based stabilizer. A method for stabilizing unsaturated hydrocarbon-based precursor material against the polymerization comprises providing a stabilizer selected from the group consisting of a hydroxybenzophenone and a nitroxyl radical based stabilizer.
Removal Of Trace Arsenic Impurities From Triethylphosphate (Tepo)
US Patent:
8039658, Oct 18, 2011
Filed:
Jul 25, 2008
Appl. No.:
12/179979
Inventors:
Steven Gerard Mayorga - Oceanside CA, US
Heather Regina Bowen - Vista CA, US
Kelly Ann Chandler - San Marcos CA, US
Heather Regina Bowen - Vista CA, US
Kelly Ann Chandler - San Marcos CA, US
Assignee:
Air Products and Chemicals, Inc. - Allentown PA
International Classification:
C07F 9/09
US Classification:
558150, 558 87, 558146, 210660, 210661, 210681, 210688, 438478, 438479, 438480, 438423
Abstract:
A method of removing trace levels of arsenic-containing impurities from raw triethylphosphate (TEPO) is disclosed. The method uses adsorption, or adsorption followed by a flash distillation. The method comprises contacting raw triethylphosphate (TEPO) with an adsorbent which selectively adsorbs the arsenic-containing impurities in the raw triethylphosphate (TEPO). The adsorbent is a base promoted alumina containing adsorbent represented by a formula: ZWwhere x is the weight percentage of Z in the adsorbent ranging from 30% to 99. 999%; y is the weight percentage of W in the adsorbent, and x+y=100%; Z is selected from the group consisting of alumina (AlO), magnesium-alumina based layered double hydroxide (MgO—AlO), alumina-zeolite, and mixtures thereof; and W is selected from the group consisting of at least one basic metal oxide, at least one basic metal carbonate, and mixtures thereof. The method will result in a final triethylphosphate (TEPO) with a few ppb to less than 1 ppb arsenic containing impurities.
Stabilizers For The Stabilization Of Unsaturated Hydrocarbon-Based Precursor
US Patent:
8092709, Jan 10, 2012
Filed:
May 17, 2011
Appl. No.:
13/109488
Inventors:
Steven Gerard Mayorga - Oceanside CA, US
Kelly Ann Chandler - San Marcos CA, US
Kelly Ann Chandler - San Marcos CA, US
Assignee:
Air Products and Chemicals, Inc. - Allentown PA
International Classification:
C09K 3/00
C09K 15/00
C09K 15/16
C09K 15/22
C07D 211/00
C07D 295/00
C09K 15/00
C09K 15/16
C09K 15/22
C07D 211/00
C07D 295/00
US Classification:
25218229, 25218211, 25218212, 252397, 252401, 252403, 546184
Abstract:
A stabilized composition consists essentially of unsaturated hydrocarbon-based materials, and a stabilizer selected from the group consisting of a hydroxybenzophenone and a nitroxyl radical based stabilizer. A method for stabilizing unsaturated hydrocarbon-based precursor material against the polymerization comprises providing a stabilizer selected from the group consisting of a hydroxybenzophenone and a nitroxyl radical based stabilizer.
Process Stability Of Nbde Using Substituted Phenol Stabilizers
US Patent:
8173213, May 8, 2012
Filed:
May 21, 2009
Appl. No.:
12/470002
Inventors:
Steven Gerard Mayorga - Oceanside CA, US
Mary Kathryn Haas - Emmaus PA, US
Mark Leonard O'Neill - Allentown PA, US
Dino Sinatore - Whitehall PA, US
Mary Kathryn Haas - Emmaus PA, US
Mark Leonard O'Neill - Allentown PA, US
Dino Sinatore - Whitehall PA, US
Assignee:
Air Products and Chemicals, Inc. - Allentown PA
International Classification:
C09K 15/08
C10L 1/183
C23C 16/40
H01L 21/00
C10L 1/183
C23C 16/40
H01L 21/00
US Classification:
42725537, 42725518, 42725523, 42725528, 25218229, 252404, 438758
Abstract:
A stabilized cyclic alkene composition comprising one or more cyclic alkenes, and at least one stabilizer compound having the Formula (I),R,R,R,R,R(C)OH Formula (I)A method for forming a layer of carbon-doped silicon oxide on a substrate, which uses the stabilized alkene composition and a silicon containing compound.
Low-Impurity Organosilicon Product As Precursor For Cvd
US Patent:
8329933, Dec 11, 2012
Filed:
Aug 8, 2011
Appl. No.:
13/205015
Inventors:
Steven Gerard Mayorga - Oceanside CA, US
Mark Leonard O'Neill - San Marcos CA, US
Kelly Ann Chandler - San Marcos CA, US
Mark Leonard O'Neill - San Marcos CA, US
Kelly Ann Chandler - San Marcos CA, US
Assignee:
Air Products and Chemicals, Inc. - Allentown PA
International Classification:
C07F 7/04
US Classification:
556470, 556442, 556466, 556467, 556471
Abstract:
The present invention provides an organosilicon composition comprising diethoxymethylsilane, a concentration of dissolved residual chloride, and a concentration of dissolved residual chloride scavenger that does not yield unwanted chloride salt precipitate when combined with another composition comprising diethoxymethylsilane.
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