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Susan L Schiefelbein, 58808 N Tioga St, Ithaca, NY 14850

Known as:
Susan Schiefelbein Schiefelbein Susan Schiefelbei Susan Hepburn Susan Noeninckx

Susan Schiefelbein Phones & Addresses

Ithaca, NY   

10879 Caton Lindley Rd, Corning, NY 14830    607-5246863   

Somerville, MA   

66 Beach Point Pl, Boston, MA 02125   

Dorchester, MA   

Horseheads, NY   

Trenton, NJ   

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Career records & work history

License Records

Susan Kay Schiefelbein

Licenses:
License #: 20154 - Expired
Category: Nursing
Issued Date: Oct 1, 1964
Effective Date: Jan 3, 2003
Expiration Date: Oct 31, 2002
Type: Registered Nurse

Susan Schiefelbein resumes & CV records

Resumes

Susan Schiefelbein Photo 13

Vice-President At Bank Of America Securities, Llc.

Location:
United States
Industry:
Financial Services
Susan Schiefelbein Photo 14

Susan Schiefelbein

Location:
United States

Publications & IP owners

Us Patents

Vacuum Ultraviolet Transmitting Direct Deposit Vitrified Silicon Oxyfluoride Lithography Glass Photomask Blanks

US Patent:
6541168, Apr 1, 2003
Filed:
Apr 24, 2001
Appl. No.:
09/841517
Inventors:
John T. Brown - Corning NY
Stephen C. Currie - Corning NY
Lisa A. Moore - Corning NY
Susan L. Schiefelbein - Corning NY
Assignee:
Corning Incorporated - Corning NY
International Classification:
G03F 900
US Classification:
430 5, 65 301
Abstract:
High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1Ã10 molecules/cm of molecular hydrogen and low chlorine levels.

Treating An Optical Fiber Preform With Carbon Monoxide

US Patent:
6813908, Nov 9, 2004
Filed:
Dec 12, 2001
Appl. No.:
10/021366
Inventors:
Kintu O. Early - Painted Post NY
Claude E. Lacy - Painted Post NY
Susan L. Schiefelbein - Corning NY
Sabyasachi Sen - Painted Post NY
Wanda J. Walczak - Big Flats NY
Joseph M. Whalen - Corning NY
Tiffany L. James - Wilmington NC
Hazel B. Matthews - Wilmington NC
Chukwuemeka B. Onuh - Wilmington NC
Assignee:
Corning Incorporated - Corning NY
International Classification:
C03B 37027
US Classification:
65399, 65426, 65424
Abstract:
The invention includes inventive methods of treating a soot preform. One method includes heating a soot preform to a temperature of less than about 1000Â C. and exposing the preform to a substantially halide free reducing agent. Preferred reducing agents include carbon monoxide and sulfur dioxide. Another inventive method of treating the preform includes exposing the preform, in a furnace, to a substantially non-chlorine containing atmosphere comprising carbon monoxide. The preform is heated to a temperature of at least about 1000Â C. Preferably this method is incorporated into the process for making an optical fiber. An additional method of treating the preform includes doping the preform with fluorine and exposing the fluorine doped preform to a substantially chlorine free atmosphere comprising at least carbon monoxide at a temperature of at least 1100Â C. , thereby reacting excess oxygen present in the furnace.

Vacuum Ultraviolet Transmitting Direct Deposit Vitrified Silicon Oxyfluoride Lithography Glass Photomask Blanks

US Patent:
6817211, Nov 16, 2004
Filed:
Jan 13, 2003
Appl. No.:
10/342717
Inventors:
John T. Brown - Corning NY
Stephen C. Currie - Corning NY
Lisa A. Moore - Corning NY
Susan L. Schiefelbein - Corning NY
Assignee:
Corning Incorporated - Corning NY
International Classification:
C03B 2000
US Classification:
65 174, 65397
Abstract:
High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1Ã10 molecules/cm of molecular hydrogen and low chlorine levels.

Fuel Cells With Enhanced Via Fill Compositions And/Or Enhanced Via Fill Geometries

US Patent:
7378173, May 27, 2008
Filed:
Apr 24, 2003
Appl. No.:
10/422356
Inventors:
Michael E Badding - Campbell NY, US
Jacqueline L Brown - Lindley NY, US
Thomas D Ketcham - Big Flats NY, US
Susan L Schiefelbein - Ithaca NY, US
Dell J St Julien - Watkins Glen NY, US
Raja R Wusirika - Painted Post NY, US
Assignee:
Corning Incorporated - Corning NY
International Classification:
H01M 8/12
H01M 8/24
US Classification:
429 32, 429 30
Abstract:
A fuel cell and method for manufacturing the fuel cell are described herein. Basically, the fuel cell is formed from an electrode/electrolyte structure including an array of anode electrodes and cathode electrodes disposed on opposing sides of an electrolyte sheet, the anode and cathode electrodes being electrically connected in series, parallel, or a combination thereof by electrical conductors that traverse via holes in the electrolyte sheet. Several different embodiments of electrical conductors which have a specific composition and/or a specific geometry are described herein.

Method For Making Low Loss Optical Fiber

US Patent:
7469559, Dec 30, 2008
Filed:
Dec 2, 2004
Appl. No.:
11/004027
Inventors:
Laura J Ball - Fountaine le Port, FR
Bruno P M Baney - Avon, FR
Dana C Bookbinder - Corning NY, US
Keith L House - Corning NY, US
Rostislav R Khrapko - Moscow, RU
Susan L Schiefelbein - Ithaca NY, US
Lisa A Moore - Corning NY, US
Assignee:
Corning Incorporated - Corning NY
International Classification:
C03C 13/04
US Classification:
65397, 65427, 65429
Abstract:
A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.

High Transmission Synthetic Silica Glass And Method Of Making Same

US Patent:
7506521, Mar 24, 2009
Filed:
Jun 8, 2005
Appl. No.:
11/148504
Inventors:
Dana Craig Bookbinder - Corning NY, US
Richard Michael Fiacco - Corning NY, US
Kenneth Edward Hrdina - Horseheads NY, US
Lisa Anne Moore - Corning NY, US
Susan Lee Schiefelbein - Ithaca NY, US
Assignee:
Corning Incorporated - Corning NY
International Classification:
C03B 20/00
C03C 3/06
US Classification:
65 173, 65 174, 65 321, 501 53, 501 54
Abstract:
Disclosed are high purity synthetic silica material having an internal transmission at 193 nm of at least 99. 65%/cm and method of preparing such material. The material is also featured by a high compositional homogeneity in a plane transverse to the intended optical axis. The soot-to-glass process for making the material includes a step of consolidating the soot preform in the presence of HO and/or O.

Low Loss Optical Fiber And Method For Making Same

US Patent:
7524780, Apr 28, 2009
Filed:
Jan 28, 2005
Appl. No.:
11/046435
Inventors:
Laura J. Ball - Corning NY, US
Bruno P. M. Baney - Seyssins, FR
Dana C. Bookbinder - Corning NY, US
Keith L. House - Corning NY, US
Rostislav R. Khrapko - Corning NY, US
Lisa A. Moore - Corning NY, US
Susan L. Schiefelbein - Ithaca NY, US
Assignee:
Corning Incorporated - Corning NY
International Classification:
C03C 13/04
C03C 3/076
C03C 3/06
US Classification:
501 37, 501 54, 501 55, 501 56, 385123, 385141, 385142, 385144
Abstract:
A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.

Synthetic Silica Glass Optical Material Having High Resistance To Laser Induced Damage

US Patent:
7534733, May 19, 2009
Filed:
Feb 22, 2005
Appl. No.:
11/064341
Inventors:
Dana Craig Bookbinder - Corning NY, US
Richard Michael Fiacco - Corning NY, US
Kenneth Edward Hrdina - Horseheads NY, US
Lisa Anne Moore - Corning NY, US
Susan Lee Schiefelbein - Ithaca NY, US
Assignee:
Corning Incorporated - Corning NY
International Classification:
C03C 3/06
C03B 19/00
C03B 37/00
US Classification:
501 54, 65 176
Abstract:
Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, of between about −1. 0 and 1. 0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm. The synthetic silica glass optical material of the present invention comprises OH concentration levels of less than about 600 ppm, preferably less than 200 ppm, and Hconcentration levels less than about 5. 0×10molecules/cmand preferably less than about 2. 0×10molecules/cm.

Possible Relatives

David W Schiefelbein  Dan Schiefelbein  Daniel R Schiefelbein  Elaine W Schiefelbein  Frank J Schiefelbein  Gary W Schiefelbein  Jeff C Schiefelbein  Susan Johnson  Susan K Standish  Susan M Standley 

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