Suzanne M Coley, 58251 Willow St, Mansfield, MA 02048

6773872, Aug 10, 2004

Dec 27, 2001

10/034756

Dana A. Gronbeck - Holliston MA
Suzanne Coley - Mansfield MA
Chi Q. Truong - Westboro MA
Ashish Pandya - Natick MA

Shipley Company, L.L.C. - Marlborough MA

G03F 7038

430326, 430325, 430905, 430910, 4302721, 430313, 430318, 430311

The present invention provides polymers which are substantially or completely free of inorganic contaminants and the use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting resists. Polymers of the invention also are suitable for use as a resin component for antireflective coating compositions (ARCs). More particularly, the invention provides methods for reducing such contaminants in polymerization initiators, particularly free radical initiators.

6852421, Feb 8, 2005

Sep 26, 2002

10/256225

Gerald B. Wayton - Leicester MA, US
Peter Trefonas, III - Medway MA, US
Suzanne Coley - Mansfield MA, US
Tomoki Kurihara - Niigata, JP

Shipley Company, L.L.C. - Marlborough MA

B32B027/08
B32B027/36
G03C001/825
G03C001/835
C08G063/40

428480, 4302711, 430325, 430523, 430531, 430533, 528288, 528289, 528291, 528292

In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.

6855466, Feb 15, 2005

Sep 15, 2001

09/952880

Edward K. Pavelchek - Stow MA, US
Timothy G. Adams - Sudbury MA, US
Manuel doCanto - Stoughton MA, US
Suzanne Coley - Mansfield MA, US
George G. Barclay - Jefferson MA, US

Shipley Company, L.L.C. - Marlborough MA

G03F007/00

430 14, 430 9, 430 18, 430290, 430950

The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.

7163751, Jan 16, 2007

May 12, 2004

10/844125

Gerald B. Wayton - Leicester MA, US
Peter Trefonas, III - Medway MA, US
Suzanne Coley - Mansfield MA, US
Tomoki Kurihara - Niigata, JP

Shipley Company, L.L.C. - Marlborough MA

B32B 27/08
B32B 27/36
G03C 1/825
G03C 1/835
C08K 5/09

428480, 4302711, 430325, 430523, 430531, 430533, 524284, 524315

In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.

7183037, Feb 27, 2007

Aug 17, 2001

09/932792

Zhibiao Mao - Sunnyvale CA, US
Suzanne Coley - Mansfield MA, US
Timothy G. Adams - Sudbury MA, US

Shipley Company, L.L.C. - Marlborough MA

G03C 1/76

4302711, 430325

The present invention provides new light absorbing compositions suitable for use as an antireflective coating (“ARC”) with an overcoated resist layer. ARCs of the invention exhibit increased etch rates in standard plasma etchants. Preferred ARCs of invention have significantly increased oxygen content relative to prior compositions.

7582360, Sep 1, 2009

Dec 5, 2006

11/633987

Gerald B. Wayton - Leicester MA, US
Peter Trefonas, III - Medway MA, US
Suzanne Coley - Mansfield MA, US
Tomoki Kurihara - Niigata, JP

Rohm and Haas Electronic Materials LLC - Marlborough MA

B32B 27/08
B32B 27/36
G03C 1/825
G03C 1/835
C08K 5/09

428480, 528308, 4302711, 430325, 430523, 430531, 430533, 524284, 524315

In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.

8501383, Aug 6, 2013

May 18, 2010

12/782350

Anthony Zampini - Westborough MA, US
Vipul Jain - Westborough MA, US
Cong Liu - Shrewsbury MA, US
Suzanne Coley - Mansfield MA, US

Rohm and Haas Electronic Materials LLC - Marlborough MA

G03F 7/004
C07D 251/34
C08G 73/08

4302701, 4302711, 430927, 528367, 528289

Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.

2003023, Dec 18, 2003

Oct 9, 2002

10/268063

Timothy Adams - Sudbury MA, US
Suzanne Coley - Mansfield MA, US

Shipley Company, L.L.C. - Marlborough MA

G03F007/038
G03C001/492
G03C001/76

430/270100, 430/326000

The invention includes polymers that contain an alicyclic group (cage group) and acetal group which can undergo a deblocking reaction in the presence of photogenerated acid. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-300 nm and sub-200 nm.