BackgroundCheck.run
Search For

Tak W Cheung, 6211011 Queens Blvd, Flushing, NY 11375

Known as:
Tak Wah Cheung
Related to:
Anita P Cheung Karina Cheung

Tak Cheung Phones & Addresses

11011 Queens Blvd, Forest Hills, NY 11375    718-2681279   

6812 Burns St #C3, Forest Hills, NY 11375   

9733 Queens Blvd, Rego Park, NY 11374    718-2741724   

Flushing, NY   

Irving, TX   

7 Hart Dr, Poughkeepsie, NY 12603    845-4712127   

Palisades Park, NJ   

Santa Fe, TX   

Queens, NY   

Get Report
Control this profile

Mentions for Tak W Cheung

Career records & work history

Lawyers & Attorneys

Tak Cheung Photo 1

Tak Cheung - Lawyer

ISLN:
913921966
Admitted:
1996
University:
University of California Los Angeles School of Law, Los Angeles CA
Tak Cheung Photo 2

Tak Cheung - Lawyer

ISLN:
915172984
Admitted:
1999
University:
University of Waterloo, B.A., 1993
Law School:
Queen's University, LL.B., 1997

Tak Cheung resumes & CV records

Resumes

Tak Cheung Photo 27

Tak Yan Cheung

Tak Cheung Photo 28

Tak Cheung

Tak Cheung Photo 29

Tak Cheung

Industry:
Medical Devices
Work:
Amo
Manager, Business Development
Tak Cheung Photo 30

Tak Hing Cheung

Tak Cheung Photo 31

Tak Cheung

Location:
Greater New York City Area
Industry:
Renewables & Environment
Tak Cheung Photo 32

Tak Cheung

Location:
United States

Publications & IP owners

Us Patents

Hard Surface Cleaning And Disinfecting Compositions Comprising A Tristyrylphenolethoxylate

US Patent:
7030078, Apr 18, 2006
Filed:
Apr 23, 2003
Appl. No.:
10/510607
Inventors:
Tak Wai Cheung - Montvale NJ, US
Dennis Thomas Smialowicz - Montvale NJ, US
Assignee:
Reckitt Benckiser Inc. - Parsippany NJ
International Classification:
C11D 3/48
C11D 1/72
US Classification:
510384, 510191, 510237, 510238, 510362, 510365, 510382, 510391, 510421, 510504
Abstract:
Hard surface cleaning and disinfecting compositions comprise a synergistic combination of a cationic surfactant having germicidal properties and a tristyrylphenolalkoxylate compound. The hard surface cleaning and disinfecting compositions provide excellent cleaning and disinfection of hard surfaces.

Hard Surface Cleaning Compositions Comprising Alginate Materials And Xanthan Gum

US Patent:
7186676, Mar 6, 2007
Filed:
Feb 17, 2004
Appl. No.:
10/510895
Inventors:
Pamela A. Boone - Montvale NJ, US
Tak Wai Cheung - Montvale NJ, US
Benjamin J. Costa - Nutley NJ, US
Edward Fu - Montvale NJ, US
Steven Wu - Montvale NJ, US
Carolyn Martinez - Montvale NJ, US
Assignee:
Reckitt Benckiser Inc. - Parsippany NJ
International Classification:
C11D 3/37
C11D 3/14
US Classification:
510418, 510235, 510236, 510238, 510253, 510268, 510269, 510368, 510426, 510438, 510471, 510477
Abstract:
The present invention is directed to a pourable acidic hard surface cleaning and/or disinfecting composition which contains suspended inclusions which appear as visibly discernible, discrete particulate materials, preferably where said discrete particulate materials are based on alginates.

Dispenser

US Patent:
D541902, May 1, 2007
Filed:
Aug 31, 2005
Appl. No.:
29/237433
Inventors:
Tak Wai Cheung - Montvale NJ, US
Edward Fu - Montvale NJ, US
Diane Neiman - Montvale NJ, US
Lamson Nguyen - Somerset NJ, US
Tri Nguyen - Montvale NJ, US
Jeanne Weller - Montvale NJ, US
Steven Wu - Montvale NJ, US
Assignee:
Reckitt Bonckiner Inc - Parsippany NJ
International Classification:
2301
US Classification:
D23208

Hard Surface Cleaner Comprising Suspended Particles And Oxidizing Agent

US Patent:
7256167, Aug 14, 2007
Filed:
Mar 15, 2005
Appl. No.:
11/080261
Inventors:
Tak Wai Cheung - Montvale NJ, US
Edward Fu - Montvale NJ, US
Pamela A. Boone - Montvale NJ, US
Steven Wu - West Nyack NY, US
Benjamin Costa - Nutley NJ, US
Assignee:
Reckitt Benckiser Inc. - Parsippany NJ
International Classification:
C11D 3/395
C11D 3/14
C11D 1/02
US Classification:
510418, 510235, 510236, 510238, 510253, 510268, 510269, 510368, 510426, 510367, 510378, 510438, 510471, 510477, 510286, 510302, 510309, 510375
Abstract:
The present invention is directed to a pourable acidic hard surface cleaning and/or disinfecting composition which contains suspended inclusions which appear as visibly discernible, discrete particulate materials, preferably where said discrete particulate materials are based on alginates.

Lavatory Device

US Patent:
D555757, Nov 20, 2007
Filed:
Jul 17, 2006
Appl. No.:
29/247859
Inventors:
Tak Wai Cheung - Montvale NJ, US
Edward Fu - Montvale NJ, US
Lamson Nguyen - Somerset NJ, US
Tri Nguyen - Montvale NJ, US
Jeanne Marie Weller - Montvale NJ, US
Steven Wu - Montvale NJ, US
Diane Neiman - Montvale NJ, US
Assignee:
Reckitt Benckiser Inc. - Montvale NJ
International Classification:
2301
US Classification:
D23208

Cleaning Compositions Comprising An Organosilicone Quaternary Ammonium Compound

US Patent:
7304022, Dec 4, 2007
Filed:
Oct 29, 2004
Appl. No.:
10/577093
Inventors:
Tak Wai Cheung - Montvale NJ, US
Edward Fu - Montvale NJ, US
Assignee:
Reckitt Benckiser Inc. - Parsippany NJ
International Classification:
C11D 1/835
C11D 9/36
C11D 3/48
US Classification:
510191, 510199, 510466, 510228, 510235, 510238, 510253, 510382, 510384, 510391, 510424, 510426, 510427, 510434, 510473, 510477, 510490
Abstract:
Thickened acidic film forming hard surface cleaning and disinfecting compositions which are particularly useful in the cleaning of ceramic surfaces, especially lavatory surfaces.

Lavatory Device

US Patent:
D574922, Aug 12, 2008
Filed:
Jul 17, 2006
Appl. No.:
29/247855
Inventors:
Tak Wai Cheung - Montvale NJ, US
Edward Fu - Montvale NJ, US
Lamson Nguyen - Somerset NJ, US
Tri Nguyen - Montvale NJ, US
Jeanne Marie Weller - Montvale NJ, US
Steven Wu - Montvale NJ, US
Diane Neiman - Montvale NJ, US
Assignee:
Reckitt Benckiser Inc. - Parsippany NJ
International Classification:
2301
US Classification:
D23208

Lavatory Device

US Patent:
D583902, Dec 30, 2008
Filed:
Aug 1, 2006
Appl. No.:
29/248171
Inventors:
Tak Wai Cheung - Montvale NJ, US
Edward Fu - Montvale NJ, US
Lamson Nguyen - Somerset NJ, US
Tri Nguyen - Montvale NJ, US
Jeanne Marie Weller - Montvale NJ, US
Steven Wu - Montvale NJ, US
Diane Neiman - Montvale NJ, US
Assignee:
Reckitt Benckiser Inc. - Parsippany NJ
International Classification:
2301
US Classification:
D23208

Possible Relatives

David Cheung  Deanna G Cheung  Daisy Cheung  Debbie Cheung  Daniel M Cheung  Aaron Cheung  Danny K Cheung  Tak Q Lam  Tak Y Leung  Tak L Li 

NOTICE: You may not use BackgroundCheck or the information it provides to make decisions about employment, credit, housing or any other purpose that would require Fair Credit Reporting Act (FCRA) compliance. BackgroundCheck is not a Consumer Reporting Agency (CRA) as defined by the FCRA and does not provide consumer reports.