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Thao Thach PhamAnaheim, CA

Thao Pham Phones & Addresses

Anaheim, CA   

Fayetteville, AR   

San Jose, CA   

Mentions for Thao Thach Pham

Career records & work history

Real Estate Brokers

Thao Pham Photo 1

Thao Pham, Fountain Valley CA - Agent

Work:
century21 beachside
Fountain Valley, CA
714-7192836 (Phone)
License #01478456

Lawyers & Attorneys

Thao Pham Photo 2

Thao Ann Pham - Lawyer

Licenses:
Texas - Eligible To Practice In Texas 1999
Education:
University of Texas School of LawDegree Doctor of Jurisprudence/Juris Doctor (J.D.)Graduated 1999
Specialties:
Health Care - 100%
Languages:
Vietnamese

Medicine Doctors

Thao Pham Photo 3

Dr. Thao N Pham, San Jose CA - DO (Doctor of Osteopathic Medicine)

Specialties:
Physical Medicine & Rehabilitation
Address:
Kaiser Permanente Hospital OCM
275 Hospital Pkwy, San Jose, CA 95119
408-9726800 (Phone)
Certifications:
Physical Medicine & Rehabilitation, 2000
Awards:
Healthgrades Honor Roll
Languages:
English
Spanish
Hospitals:
Kaiser Permanente Hospital OCM
275 Hospital Pkwy, San Jose, CA 95119
Kaiser Permanente San Jose Medical Center
250 Hospital Parkway, San Jose, CA 95119
Kaiser Permanente Santa Clara Medical Center
700 Lawrence Expressway, Santa Clara, CA 95051
Education:
Medical School
UMDNJ School Of Osteopathic Medicine
Graduated: 1995
Medical School
Nyu Hospitals Center
Graduated: 1995
Medical School
St Vincent's Med Center
Graduated: 1995
Thao Pham Photo 4

Dr. Thao T Pham, Milpitas CA - MD (Doctor of Medicine)

Specialties:
Internal Medicine
Age:
47
Address:
770 E Calaveras Blvd, Milpitas, CA 95035
408-9452933 (Phone)
Certifications:
Internal Medicine, 2007
Awards:
Healthgrades Honor Roll
Languages:
English
Vietnamese
Education:
Medical School
New York Medical College
Graduated: 2004

Thao P. Pham

Specialties:
Family Medicine
Work:
Henry Ford Medical GroupHenry Ford Macomb Fraser Health Center
15717 15 Mile Rd, Clinton Township, MI 48035
586-2853800 (phone) 586-2853818 (fax)
Site
Education:
Medical School
Des Moines University College of Osteopathic Medicine
Graduated: 1999
Procedures:
Destruction of Benign/Premalignant Skin Lesions, Electrocardiogram (EKG or ECG), Hearing Evaluation, Osteopathic Manipulative Treatment, Pulmonary Function Tests, Vaccine Administration
Conditions:
Abdominal Aortic Aneurysm, Abnormal Vaginal Bleeding, Acne, Acute Bronchitis, Acute Conjunctivitis, Acute Otitis Externa, Acute Pharyngitis, Acute Sinusitis, Acute Upper Respiratory Tract Infections, Allergic Rhinitis, Alopecia Areata, Anal Fissure, Anal or Rectal Abscess, Anemia, Anxiety Dissociative and Somatoform Disorders, Anxiety Phobic Disorders, Aortic Valvular Disease, Atopic Dermatitis, Atrial Fibrillation and Atrial Flutter, Attention Deficit Disorder (ADD), Autism, Bacterial Pneumonia, Bell's Palsy, Benign Paroxysmal Positional Vertigo, Benign Prostatic Hypertrophy, Bipolar Disorder, Breast Disorders, Bronchial Asthma, Burns, Calculus of the Urinary System, Candidiasis, Candidiasis of Vulva and Vagina, Cardiac Arrhythmia, Carpel Tunnel Syndrome, Chickenpox, Cholelethiasis or Cholecystitis, Chronic Bronchitis, Chronic Sinusitis, Conduction Disorders, Congenital Anomalies of the Heart, Constipation, Contact Dermatitis, Dehydration, Depressive Disorders, Dermatitis, Diabetes Mellitus (DM), Disorders of Lipoid Metabolism, Diverticulitis, Diverticulosis, Epilepsy, Erectile Dysfunction (ED), Female Infertility, Fractures, Dislocations, Derangement, and Sprains, Gastritis and Duodenitis, Gastroesophageal Reflux Disease (GERD), Gastrointestinal Hemorrhage, Genital HPV, Gingival and Periodontal Diseases, Gout, Hearing Loss, Heart Failure, Hemolytic Anemia, Hemorrhoids, Herpes Genitalis, Herpes Simplex, Herpes Zoster, Hypertension (HTN), Hypothyroidism, Infectious Liver Disease, Infectious Mononucleosis, Inflammatory Bowel Disease (IBD), Internal Derangement of Knee Cartilage, Intervertebral Disc Degeneration, Intestinal Obstruction, Intracranial Injury, Iron Deficiency Anemia, Irritable Bowel Syndrome (IBS), Keratitis, Labyrinthitis, Lateral Epicondylitis, Menopausal and Postmenopausal Disorders, Metabolic Syndrome, Migraine Headache, Non-Toxic Goiter, Obstructive Sleep Apnea, Osteoarthritis, Osteoporosis, Otitis Media, Overweight and Obesity, Peptic Ulcer Disease, Peripheral Nerve Disorders, Phlebitis and Thrombophlebitis, Plantar Fascitis, Plantar Warts, Pneumonia, Poisoning by Drugs, Meds, or Biological Substances, Polycystic Ovarian Syndrome (PCOS), Post Traumatic Stress Disorder (PTSD), Psoriasis, Pulmonary Embolism, Raynaud's Disease, Restless Leg Syndrome, Rheumatoid Arthritis, Rosacea, Rotator Cuff Syndrome and Allied Disorders, Schizophrenia, Sciatica, Scoliosis or Kyphoscoliosis, Sexually Transmitted Diseases (STDs), Skin and Subcutaneous Infections, Substance Abuse and/or Dependency, Systemic Lupus Erythematosus, Tension Headache, Tinea Pedis, Tinea Unguium, Urinary Incontinence, Urinary Tract Infection (UT), Ventral Hernia, Vitamin D Deficiency
Languages:
English, Vietnamese
Description:
Dr. Pham graduated from the Des Moines University College of Osteopathic Medicine in 1999. Dr. Pham works in Clinton Township, MI and specializes in Family Medicine. Dr. Pham is affiliated with Henry Ford Macomb Hospital.
Thao Pham Photo 5

Thao Pham, Santa Ana CA - DPT (Diphtheria, pertussis, tetanus)

Specialties:
Physical Therapy
Pediatric Physical Therapy
Address:
200 W Santa Ana Blvd Suite 100, Santa Ana, CA 92701
714-9924292 (Phone)
Languages:
English
Thao Pham Photo 6

Thao T Pham, Placentia CA

Specialties:
Speech-Language Pathology
Address:
377 E Chapman Ave Suite 220, Placentia, CA 92870
714-5284405 (Phone) 714-5288162 (Fax)
Languages:
English

Thao H. Pham

Specialties:
Allergy & Immunology, Pediatric Allergy/Immunology
Work:
Central Allergy Asthma Clinic
201 S 5 St STE 11, Bardstown, KY 40004
502-3484422 (phone) 270-7375235 (fax)
Central Allergy & Asthma
914 N Dixie Ave STE 100, Elizabethtown, KY 42701
270-6515897 (phone) 270-7375235 (fax)
Central Allergy & Asthma
310 S Main St, Leitchfield, KY 42754
270-2594422 (phone) 270-7375235 (fax)
Education:
Medical School
Vanderbilt University School of Medicine
Graduated: 1996
Conditions:
Allergic Rhinitis, Bronchial Asthma, Chronic Sinusitis
Languages:
English, Vietnamese
Description:
Dr. Pham graduated from the Vanderbilt University School of Medicine in 1996. She works in Elizabethtown, KY and 2 other locations and specializes in Allergy & Immunology and Pediatric Allergy/Immunology. Dr. Pham is affiliated with Hardin Memorial Hospital, Taylor Regional Hospital and Twin Lakes Regional Medical Center.

Thao N. Pham

Specialties:
Occupational Medicine
Work:
Kaiser Permanente Medical GroupKaiser Permanente Medical Center-Occupational Health
275 Hospital Pkwy FL 5, San Jose, CA 95119
408-9726800 (phone) 408-9726117 (fax)
Site
Education:
Medical School
UMDNJ School of Osteopathic Medicine
Graduated: 1995
Languages:
English, Spanish
Description:
Dr. Pham graduated from the UMDNJ School of Osteopathic Medicine in 1995. He works in San Jose, CA and specializes in Occupational Medicine. Dr. Pham is affiliated with Kaiser Permanente San Jose Medical Center and Kaiser Permanente Santa Clara Medical Center.
Thao Pham Photo 7

Thao Thidieu Pham

Specialties:
Internal Medicine

License Records

Thao Thu Pham

Licenses:
License #: PNT.047537 - Active
Issued Date: Sep 25, 2014
Expiration Date: Sep 25, 2019
Type: Pharmacy Intern

Thao Pham

Licenses:
License #: 1201093002
Category: Cosmetologist License

Thao May Pham

Licenses:
License #: 1206018572
Category: Nail Technician License

Thao Pham resumes & CV records

Resumes

Thao Pham Photo 50

Thao Pham - Stanton, CA

Work:
GOOD JOBS, INC 1997 to 2014
Payroll Accountant
STEPHEN & SON, INC. C.P.A - Laguna Hills, CA 1991 to 1997
Payroll Accountant
Thao Pham Photo 51

Thao Pham - San Jose, CA

Work:
Best Drug Rehabilitation Services 2012 to 2000
Content Writer
Grassroots Campaigns 2012 to 2000
Political Activist/Fundraiser
Blowfish Sushi to Die For 2012 to 2000
Bar Attendant
The Brittania Arms San Jose - San Jose, CA 2010 to 2011
Bar Attendant
STRIKE - Cupertino, CA 2007 to 2010
Bar Attendant/Waitress
Education:
San Jose State University 2009 to 2010
BA Diploma
De Anza College 2007 to 2009
AA Diploma
Homestead High School 2002 to 2006
High School Diploma
Skills:
Critical thinking, writing, researching, administration, legal research, inventory management, communication, training
Thao Pham Photo 52

Thao Pham - Mission Viejo, CA

Work:
TRIUMPH INSULATION SYSTEMS, LLC - Hawthorne, CA 2008 to 2014
Assistant Controller
MEMORY EXPERTS, INC - Santa Ana, CA 2006 to 2008
Site Controller
MERIT PROPERTY MANAGEMENT, INC - Aliso Viejo, CA 2003 to 2006
Controller
Education:
CALIFORNIA STATE UNIVERSITY FULLERTON - Fullerton, CA
Bachelor of Arts in Business Administration
Thao Pham Photo 53

Thao Pham - Santa Ana, CA

Work:
Fehr & Peers - Anaheim, CA Feb 2011 to Jan 2013
Transportation Engineer
Kunzman Associates, Inc - Orange, CA Nov 2009 to Feb 2011
Junior Associate
I - GIS - Irvine, CA Mar 2006 to Apr 2009
GIS Intern
Education:
California State Polytechnic University Dec 2008
Bachelor of Science in Civil Engineering
Thao Pham Photo 54

Thao Pham - Fontana, CA

Work:
I&A Lab Inc 2007 to 2000
Microbiology Technician
M.T.C. Corp - Industry, CA 2006 to 2007
Lab Technician
Chaffey Community College - Rancho Cucamonga, CA 2004 to 2006
Chemistry Department Student Lab Assistant
Chaffey Community College - Rancho Cucamonga, CA 2004 to 2006
Peer Advisor
Spinal Care Chiropractic Center - Rancho Cucamonga, CA 2003 to 2004
Medical Assistant
Education:
California State Polytechnic University 2006 to 2010
Bachelor of Science in Biotechnology
Chaffey Community College 2004 to 2006
Associate in Chemistry

Publications & IP owners

Us Patents

Method Of Manufacturing High Aspect Ratio Photolithographic Features

US Patent:
6664026, Dec 16, 2003
Filed:
Mar 22, 2001
Appl. No.:
09/815540
Inventors:
Son Van Nguyen - San Jose CA
Neil Leslie Robertson - Palo Alto CA
Thomas Edward Dinan - San Jose CA
Thao Duc Pham - San Jose CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G03F 700
US Classification:
430311, 430313, 430316, 430317, 430318, 438702, 216 72, 4272497
Abstract:
An etch barrier to be used in a photolithograph process is disclosed. A silicon rich etch barrier is deposited on a substrate using a low energy deposition technique. A diamond like carbon layer is deposited on the silicon rich etch barrier. Photoresist is then placed on this etch barrier DLC combination. To form photolithographic features, successive steps of oxygen and flourine reactive ion etching is used.

Chemical Mechanical Polishing Thickness Control In Magnetic Head Fabrication

US Patent:
6776917, Aug 17, 2004
Filed:
Jan 3, 2001
Appl. No.:
09/754235
Inventors:
Richard Hsiao - San Jose CA
Son Van Nguyen - Los Gatos CA
Thao Pham - San Jose CA
Eugene Zhao - San Jose CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
B44C 122
US Classification:
216 88, 216 89, 216 94, 451 29, 438691, 438692
Abstract:
The method for controlling the depth of polishing during a CMP process involves the deposition of a polishing stop layer at an appropriate point in the device fabrication process. The stop layer is comprised of a substance that is substantially more resistant to polishing with a particular polishing slurry that is utilized in the CMP process than a polishable material layer. Preferred stop layer materials of the present invention are tantalum and diamond-like carbon (DLC), and the polishable layer may consist of alumina. In one embodiment of the present invention the stop layer is deposited directly onto the top surface of components to be protected during the CMP process. A polishable layer is thereafter deposited upon the stop layer, and the CMP polishing step removes the polishable material layer down to the portions of the stop layer that are deposited upon the top surfaces of the components. The stop layer is thereafter removed from the top surface of the components. In this embodiment, the fabricated height of the components is preserved.

Method Of Improving The Reliability Of Magnetic Head Sensors By Ion Milling Smoothing

US Patent:
6804878, Oct 19, 2004
Filed:
Dec 21, 1999
Appl. No.:
09/468603
Inventors:
Richard Thomas Campbell - Campbell CA
Richard Hsiao - San Jose CA
Yiping Hsiao - San Jose CA
Son Van Nguyen - Los Gatos CA
Thao John Pham - San Jose CA
Assignee:
Hitachi Global Storage Technologies Netherlands B.V.
International Classification:
G11B 5112
US Classification:
2960312, 2960315, 2960316, 2960318, 216 22, 216 52, 216 66, 451 41, 20419234
Abstract:
A method is provided of smoothing the perturbations on a surface, in particular the surface of a magnetic head slider, the method comprising several steps. At least one air-bearing surface to be smoothed is exposed to an ion species generated from a defined source to form a beam of incident radiation. The beam has a linear axis emanating from the source and thus forms an angle of incident radiation with respect to the surface to be smoothed. The at least one surface is smoothed by exposing the surface(s) to be smoothed to the beam of incident radiation, where the angle of incident radiation is less than 90Â relative to a vertical axis drawn perpendicular to the surface to be smoothed. To make a corrosion resistant magnetic head slider, the method further comprises coating the smoothed surface with a layer of amorphous carbon.

Method Of Fabricating Thin Film Calibration Features For Electron/Ion Beam Image Based Metrology

US Patent:
7323350, Jan 29, 2008
Filed:
Sep 30, 2004
Appl. No.:
10/957097
Inventors:
Sukhbir Singh Dulay - San Jose CA, US
Justin Jia-Jen Hwu - San Jose CA, US
Thao John Pham - San Jose CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
H01L 21/00
H01L 23/58
US Classification:
438 10, 438 17, 257 48
Abstract:
A method of making and using thin film calibration features is described. To fabricate a calibration standard according to the invention raised features are first formed from an electrically conductive material with a selected atomic number. A conformal thin film layer is deposited over the exposed sidewalls of the raised features. The sidewall material is selected to have a different atomic number and is preferably an nonconductive such as silicon dioxide or alumina. After the nonconductive material deposition, a controlled directional RIE process is used to remove the insulator layer deposited on the top and bottom surface of the lines and trenches. The remaining voids between the sidewalls of the raised features are filled with a conductive material. The wafer is then planarized with chemical mechanical planarization (CMP) to expose the nonconductive sidewall material on the surface. The nonconductive sidewall material will be fine lines embedded in conductive material.

Method For Manufacturing A Magnetic Write Head

US Patent:
7454828, Nov 25, 2008
Filed:
Nov 23, 2005
Appl. No.:
11/286076
Inventors:
Sukhbir Singh Dulay - San Jose CA, US
Justin Jia-Jen Hwu - San Jose CA, US
Thao John Pham - San Jose CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
G11B 5/127
H04R 31/00
US Classification:
2960316, 2960313, 2960315, 2960318, 216 62, 216 65, 216 66, 20419234, 360122, 360317, 451 5, 451 41
Abstract:
A method for measuring recession in a wafer undergoing an asymmetrical ion mill process. The method includes the formation of first and second reference features and possibly a dummy feature. The reference features are constructed such that the location of the midpoint between them is unaffected by the asymmetrical ion mill. By measuring the distance between a portion of the dummy feature and the midpoint between the reference features, the amount of recession of the dummy feature can be measured. The measurement can be used to calculate the relative location of the flare to the read sensor rear edge through overlay information. By keeping the angles of the sides of the features steep (ie. nearly parallel with the direction in which the ion mill is asymmetrical) the amount of material consumed on each of the reference features is substantially equal and the midpoint between the reference features is substantially stationary.

Scissor Sensor With Back Edge Bias Structure And Novel Dielectric Layer

US Patent:
2015015, Jun 4, 2015
Filed:
Dec 2, 2013
Appl. No.:
14/094690
Inventors:
- Amsterdam, NL
Quang Le - San Jose CA, US
Thao Pham - San Jose CA, US
David J. Seagle - Morgan Hill CA, US
Hicham M. Sougrati - Elk Grove CA, US
Petrus A. Van Der Heijden - Cupertino CA, US
Assignee:
HGST Netherlands B.V. - Amsterdam
International Classification:
G11B 5/39
Abstract:
A scissor type magnetic sensor having an improved back edge bias structure. The back edge bias structure extends beyond the sides of the sensor stack for improved bias moment and is formed on a flat topography that provide for improved magnetic biasing. The sensor is formed by a method that includes first defining a sensor width and then depositing a multi-layer insulation layer that includes a dielectric layer that is resistant to ion milling and the depositing a fill layer over the dielectric layer that is removable by ion milling. After the multi-layer insulation layer has been deposited the back edge (i.e. stripe height) of the sensor is formed by masking and ion milling. This ion milling removes portions of the non-magnetic, electrically insulating fill layer that extend beyond the stripe height and beyond the sides of the sensor, leaving the dielectric layer there-beneath.

Method For Manufacturing A Magnetoresistive Sensor

US Patent:
2014017, Jun 19, 2014
Filed:
Dec 13, 2012
Appl. No.:
13/714148
Inventors:
- Amsterdam, NL
Aron Pentek - San Jose CA, US
Thao Pham - San Jose CA, US
Yi Zheng - San Ramon CA, US
Assignee:
HGST NETHERLANDS B.V. - Amsterdam
International Classification:
H01L 29/66
US Classification:
438 3
Abstract:
A method for manufacturing a magnetic sensor that allows the sensor to be constructed with a very narrow track width and with smooth, well defined side walls. A tri-layer mask structure is deposited over a series of sensor layers. The tri-layer mask structure includes an under-layer, a Si containing hard mask deposited over the under-layer and a photoresist layer deposited over the Si containing hard mask. The photoresist layer is photolithographically patterned to define a photoresist mask. A first reactive ion etching is performed to transfer the image of the photoresist mask onto the Si containing hard mask. The first reactive ion etching is performed in a chemistry that includes CF, CHF, O, and He. A second reactive ion etching is then performed in an oxygen chemistry to transfer the image of the Si containing hard mask onto the under-layer, and an ion milling is performed to define the sensor.

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