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Theresa Chow Liu, 50938 Berkshire Ave, Sunnyvale, CA 94087

Theresa Liu Phones & Addresses

938 Berkshire Ave, Sunnyvale, CA 94087   

Grass Valley, CA   

Mountain View, CA   

Potomac, MD   

El Cerrito, CA   

Berkeley, CA   

Germantown, MD   

Santa Clara, CA   

Mentions for Theresa Chow Liu

Career records & work history

Medicine Doctors

Theresa M. Liu

Specialties:
Optometry
Work:
Kaiser Permanente Medical GroupKaiser Permanente Oakland Medical Center Eye Care Services
3772 Howe St FL 3, Oakland, CA 94611
510-7521235 (phone) 510-7251650 (fax)
Site
Languages:
Chinese, English, Spanish
Description:
Dr. Liu works in Oakland, CA and specializes in Optometry. Dr. Liu is affiliated with Kaiser Permanente Vallejo Medical Center.

Theresa Liu resumes & CV records

Resumes

Theresa Liu Photo 27

Program Manager At Google

Location:
701 south Santa Fe St, Pauls Valley, OK 73075
Industry:
Internet
Work:
Google
Program Manager at Google
Theresa Liu Photo 28

Theresa Liu

Theresa Liu Photo 29

Theresa Liu

Theresa Liu Photo 30

Theresa Liu

Theresa Liu Photo 31

Theresa Liu

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Theresa Liu

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Theresa Liu

Location:
United States

Publications & IP owners

Us Patents

Ramp Temperature Techniques For Improved Mean Wafer Before Clean

US Patent:
2005010, May 12, 2005
Filed:
Nov 12, 2003
Appl. No.:
10/712464
Inventors:
Won Bang - Santa Clara CA, US
Kevin Mukai - Santa Clara CA, US
Theresa Marie Liu - Sunnyvale CA, US
Assignee:
APPLIED MATERIALS, INC., A Delaware corporation - Santa Clara CA
International Classification:
H01L021/76
H01L021/302
H01L021/461
H01L021/31
H01L021/469
US Classification:
438761000, 438787000, 438781000, 438784000, 438435000
Abstract:
A method of operating a substrate processing chamber comprising transferring a first substrate into the substrate processing chamber and heating the substrate to a first temperature of at least 510 C.; depositing an insulating layer over the first substrate while reducing the temperature of the substrate from the first temperature to a second temperature that is lower than the first temperature; transferring the first substrate out of the substrate processing chamber; removing unwanted deposition material formed on interior surfaces of the chamber during the depositing step by introducing reactive halogen species into the chamber while increasing the temperature of chamber; transferring a second substrate into the substrate processing chamber and heating the substrate to the first temperature; and depositing an insulating layer over the second substrate while reducing the temperature of the substrate from the first temperature to the second temperature.

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