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Thomas A Pandolfi, 761834 Berryman St, Berkeley, CA 94703

Known as:
Tom Pandolfi Pat Pandolfi Robert Slade
Related to:
Gregory S Pandolfi 30 Yuko Hoshi 60

Thomas Pandolfi Phones & Addresses

1834 Berryman St, Berkeley, CA 94703    510-2805431   

Pacific Grove, CA   

101 Phillips Ave, Rockport, MA 01966   

19 Gina Ln, Marlborough, CT 06447   

Palo Alto, CA   

Anderson, IN   

1834 Berryman St, Berkeley, CA 94703   

Social networks

Thomas A Pandolfi

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Work

Company: Cogverse academy Oct 2014 Position: Co-founder

Education

Degree: Bachelors, Bachelor of Science School / High School: Worcester Polytechnic Institute 1967 to 1971 Specialities: Physics

Skills

Software Deployment • C++ • Control Systems Design • Scientific Visualization • C# • Visual Studio • Physics • Engineering • Object Oriented Design • Simulations • Scanning Electron Microscopy • Visio • C • Software Development • Image Processing • Xml • Eclipse • Programming • Software Engineering • Applied Physics • Debugging • Embedded Systems • Entrepreneurship • Linux • Multi Platform Development • Multithreading • Semiconductors • Testing • Visual C++ • Electronics • Systems Engineering • R • Automation • Visual C

Industries

Semiconductors
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Mentions for Thomas A Pandolfi

Thomas Pandolfi resumes & CV records

Resumes

Thomas Pandolfi Photo 19

Co-Founder

Location:
Berkeley, CA
Industry:
Semiconductors
Work:
Cogverse Academy
Co-Founder Varian Semiconductor Nov 2006 - Nov 2012
Senior Software Engineer Applied Materials 2006 - 2012
Senior Software Engineer Northrop Grumman Corporation Apr 2006 - Nov 2006
System Software Programmer Anteon Jan 1994 - Oct 2005
Software Architect Csc Nov 1991 - Apr 1994
Member Adv Staff Datacopy 1985 - 1990
Senior Staff Engineer Hewlett-Packard Feb 1981 - Nov 1981
Development Engineer Varian Associates Feb 1976 - Feb 1981
Senior Software Engineer Princeton University Feb 1972 - Feb 1976
Professional Technical Staff
Education:
Worcester Polytechnic Institute 1967 - 1971
Bachelors, Bachelor of Science, Physics
Skills:
Software Deployment, C++, Control Systems Design, Scientific Visualization, C#, Visual Studio, Physics, Engineering, Object Oriented Design, Simulations, Scanning Electron Microscopy, Visio, C, Software Development, Image Processing, Xml, Eclipse, Programming, Software Engineering, Applied Physics, Debugging, Embedded Systems, Entrepreneurship, Linux, Multi Platform Development, Multithreading, Semiconductors, Testing, Visual C++, Electronics, Systems Engineering, R, Automation, Visual C

Publications & IP owners

Us Patents

Ion Beam Incident Angle Detection Assembly And Method

US Patent:
8309938, Nov 13, 2012
Filed:
Sep 29, 2009
Appl. No.:
12/568781
Inventors:
Thomas A. Pandolfi - Rockport MA, US
Assignee:
Varian Semiconductor Equipment Associates, Inc. - Gloucest MA
International Classification:
H01J 37/08
US Classification:
250398, 255397, 25549221
Abstract:
In an ion implanter, a detector assembly is employed to monitor the ion beam current and incidence angle at the location of the work piece or wafer. The detector assembly includes a plurality of pairs of current sensors and a blocker panel. The blocker panel is disposed a distance away from the sensors to allow certain of the beamlets that comprise the ion beam to reach the sensors. Each sensor in a pair of sensors measures the beam current incident thereon and the incident angle is calculated using these measurements. In this manner, beam current and incidence angle variations may be measured at the work piece site and be accommodated for, thereby avoiding undesirable beam current profiles.

Ion Beam Incident Angle Detection Assembly And Method

US Patent:
8455848, Jun 4, 2013
Filed:
Oct 10, 2012
Appl. No.:
13/648775
Inventors:
Thomas A. Pandolfi - Rockport MA, US
Assignee:
Varian Semiconductor Equipment Associates, Inc. - Gloucester MA
International Classification:
H01J 37/317
US Classification:
25049221, 250397
Abstract:
In an ion implanter, a detector assembly is employed to monitor the ion beam current and incidence angle at the location of the work piece or wafer. The detector assembly includes a plurality of pairs of current sensors and a blocker panel. The blocker panel is coupled to the detector array to move together with the detector array. The blocker panel is also disposed a distance away from the sensors to allow certain of the beamlets that comprise the ion beam to reach the sensors. Each sensor in a pair of sensors measures the beam current incident thereon and the incident angle is calculated using these measurements. In this manner, beam current and incidence angle variations may be measured at the work piece site and be accommodated for, thereby avoiding undesirable beam current profiles.

Possible Relatives

David J Pandolfi  Donna F Pandolfi  Francis J Pandolfi  Gary T Pandolfi  Jamie L Pandolfi  John F Pandolfi  Joseph L Pandolfi  Thomas D Johnson  Thomas Stamps  Thomas W Stancil 

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