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Trung V Doan, 59281 Livonia Pl, San Jose, CA 95111

Known as:
Trung V Doang
Related to:
Nguyen V Hoang 55 Cuoc V Tran 86

Trung Doan Phones & Addresses

San Jose, CA   

Milpitas, CA   

Campbell, CA   

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Career records & work history

License Records

Trung Vinh Doan

Licenses:
License #: PNT.047874 - Active
Issued Date: Oct 5, 2015
Expiration Date: Oct 5, 2020
Type: Pharmacy Intern

Trung Doan resumes & CV records

Resumes

Trung Doan Photo 36

Animator

Location:
Los Angeles, California
Industry:
Animation
Education:
iAnimate 2013 - 2015
AnimationMentor 2009 - 2011
Diploma, Animation California State University-Sacramento
Bachelors of Science, Business
Skills:
Facial Animation, Animation, Character Animation, Maya, Cinematics, Motionbuilder, 3D Studio Max
Interests:
Drawing, painting, movies, video games, animation, traveling, meeting new people, and trying new foods.
Trung Doan Photo 37

Trung Doan

Location:
United States
Trung Doan Photo 38

Trung Doan

Location:
United States
Skills:
Microsoft Excel, Microsoft Office

Publications & IP owners

Us Patents

Polishing Pad Conditioner And Methods Of Manufacture And Recycling

US Patent:
6945857, Sep 20, 2005
Filed:
Jul 8, 2004
Appl. No.:
10/888941
Inventors:
Trung Doan - Los Gatos CA, US
Venkata R. Balagani - Gilroy CA, US
Kenny King-Tai Ngan - Fremont CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
B24B001/00
US Classification:
451 56, 451 72, 451443, 451539
Abstract:
A recycled polishing pad conditioner comprises a base plate and a reversed abrasive disc that is flipped over from its original configuration. The reversed disc comprises an exposed abrasive face having an unused abrasive face comprising abrasive particles. A bond face of the disc is affixed to the base plate, the bond face comprising a used abrasive face that was previously used to condition polishing pads. Also described is a pad conditioner having an abrasive face comprising exposed portions of abrasive particles, with at least about 60% of the abrasive particles having a crystalline structure with substantially the same crystal symmetry.

Polishing Pad Refurbisher For In Situ, Real-Time Conditioning And Cleaning Of A Polishing Pad Used In Chemical-Mechanical Polishing Of Microelectronic Substrates

US Patent:
RE39195, Jul 18, 2006
Filed:
Dec 19, 2001
Appl. No.:
10/054692
Inventors:
Trung T. Doan - Los Gatos CA, US
Gurtej S. Sandhu - Boise ID, US
Assignee:
Micron Technology, Inc. - Boise ID
International Classification:
B24B 7/08
US Classification:
451443, 451444, 451287, 451290
Abstract:
A pad refurbisher that provides in situ, real-time conditioning and/or cleaning of a polishing surface on a polishing pad used in chemical-mechanical polishing of a semiconductor wafer and other microelectronic substrates. The pad refurbisher has a body adapted for attachment to a wafer carrier of a chemical-mechanical polishing machine, and a refurbishing element connected to the body. The body has a distal face positioned proximate to a perimeter portion of the wafer carrier and facing generally toward the polishing surface of the polishing pad. The body travels with the wafer carrier as the wafer carrier moves over the polishing pad. The refurbishing element is connected to the distal face of the body so that the refurbishing element can operatively engage the polishing surface substantially adjacent to the perimeter of the wafer carrier. The refurbishing element is a pad conditioning device and/or a pad cleaning device that conditions and/or cleans the polishing surface of the pad to remove waste particles from the polishing surface of the polishing pad and place the pad in a desired polishing condition. In operation, the refurbishing element travels with the wafer carrier and is selectively engaged with the polishing surface while the wafer carrier presses the wafer against the polishing surface to selectively condition and/or clean generally only the deteriorated areas on the pad.

Coating For Aluminum Component

US Patent:
7323230, Jan 29, 2008
Filed:
Aug 2, 2004
Appl. No.:
10/910096
Inventors:
Trung T. Doan - Los Gatos CA, US
Kenny King-Tai Ngan - Fremont CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H05H 1/24
H05H 1/30
C23C 14/00
US Classification:
427569, 427575, 427576, 427252, 42725526, 4273833
Abstract:
A coated aluminum component for a substrate processing chamber comprises an aluminum component having a surface; a first aluminum oxide layer formed on the surface of the aluminum component, the aluminum oxide layer having a surface comprising penetrating surface features; and a second aluminum oxide layer on the first aluminum oxide layer, the second aluminum oxide layer substantially completely filling the penetrating surface features of the first aluminum oxide layer. A method of forming the coated aluminum component is also described.

Retaining Ring With Shaped Surface

US Patent:
7344434, Mar 18, 2008
Filed:
Nov 12, 2004
Appl. No.:
10/988211
Inventors:
Hung Chih Chen - Santa Clara CA, US
Steven M. Zuniga - Soquel CA, US
Charles C. Garretson - San Jose CA, US
Douglas R. McAllister - Pleasanton CA, US
Stacy Meyer - San Jose CA, US
Trung T. Doan - Los Gatos CA, US
Daniel Cam Toan Lu - San Francisco CA, US
Romain Beau De Lamenie - Menlo Park CA, US
Venkata R. Balagani - Gilroy CA, US
Aden Martin Allen - Oakland CA, US
Michael Jon Fong - Mill Valley CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
B24B 5/00
US Classification:
451285, 451398
Abstract:
A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.

Light Emitting Diode With Conducting Metal Substrate

US Patent:
7432119, Oct 7, 2008
Filed:
Jan 11, 2005
Appl. No.:
11/032882
Inventors:
Trung Tri Doan - Los Gatos CA, US
Assignee:
Semileds Corporation - Milpitas CA
International Classification:
H01L 21/20
US Classification:
438 33, 438459, 438113, 257E33066
Abstract:
Systems and methods for fabricating a light emitting diode include forming a multilayer epitaxial structure above a carrier substrate; depositing at least one metal layer above the multilayer epitaxial structure; removing the carrier substrate.

Refurbishment Of Sputtering Targets

US Patent:
7504008, Mar 17, 2009
Filed:
Mar 12, 2004
Appl. No.:
10/799361
Inventors:
Trung T. Doan - Los Gatos CA, US
Kenny King-Tai Ngan - Fremont CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
C23C 2/00
C23C 6/00
C23C 14/34
C23C 30/00
US Classification:
20419238, 75246, 20429812, 419 5, 419 8, 419 26, 427452
Abstract:
In a method of refurbishing a deposition target, a surface of the target is provided in a process zone. An electrical arc is generated in the process zone, and a consumable metal wire is inserted into the process zone to form liquefied metal. A pressurized gas is injected into the process zone to direct the liquefied metal toward the surface of the target to splatter the liquefied metal on the surface, thereby forming a coating having the metal on at least a portion of the surface of the target that exhibits reduced contamination from the environment.

Attaching Components Of A Carrier Head

US Patent:
7530153, May 12, 2009
Filed:
Sep 21, 2005
Appl. No.:
11/233154
Inventors:
Trung T. Doan - Los Gatos CA, US
Jeffrey Schmidt - San Jose CA, US
Douglas R. McAllister - Pleasanton CA, US
Stacy Meyer - San Jose CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
B23P 11/00
B23P 19/00
B23P 21/00
B23Q 17/00
B23Q 17/24
US Classification:
2940701, 2940702, 2940704, 2940705, 2940709, 294071, 2952501, 29709
Abstract:
Techniques for attaching a retaining ring to a carrier head so that the bottom surface of the retaining ring is orthogonal to a central rotational axis of the carrier head are described.

Retaining Ring With Shaped Surface

US Patent:
7927190, Apr 19, 2011
Filed:
Mar 17, 2008
Appl. No.:
12/049650
Inventors:
Hung Chih Chen - Santa Clara CA, US
Steven M. Zuniga - Soquel CA, US
Charles C. Garretson - San Jose CA, US
Douglas R. McAllister - Pleasanton CA, US
Jian Lin - Milpitas CA, US
Stacy Meyer - San Jose CA, US
Sidney P. Huey - Fremont CA, US
Jeonghoon Oh - Sunnyvale CA, US
Trung T. Doan - Los Gatos CA, US
Jeffrey Schmidt - San Jose CA, US
Martin S. Wohlert - San Jose CA, US
Kerry F. Hughes - San Francisco CA, US
James C. Wang - Saratoga CA, US
Danny Cam Toan Lu - San Francisco CA, US
Romain Beau De Lamenie - Menlo Park CA, US
Venkata R. Balagani - Gilroy CA, US
Aden Martin Allen - Oakland CA, US
Michael Jon Fong - Mill Valley CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
B24B 5/00
US Classification:
451398, 451 41, 451285
Abstract:
A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.

Possible Relatives

David R Doan  Dean N Doan  Dana C Doan  Dang V Doan  Daniel Doan  Denise C Doan  Denny Doan  Trung T Lam  Trung K Le  Trung Q Lee 

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