Vikramjit Singh, 35El Cajon, CA

2021036, Nov 25, 2021

Aug 3, 2021

17/392713

- Plantation FL, US
Eric C. Browy - Meridian ID, US
Victor Kai Liu - Mountain View CA, US
Samarth Bhargava - Saratoga CA, US
Vikramjit Singh - Pflugerville TX, US
Michal Beau Dennison Vaughn - Round Rock TX, US
Joseph Christopher Sawicki - Austin TX, US

G02B 27/01
G02B 27/42
G02B 6/35
G02B 6/34
G02B 6/293
G02B 30/50

An eyepiece for a head-mounted display includes one or more first waveguides arranged to receive light from a spatial light modulator at a first edge, guide at least some of the received light to a second edge opposite the first edge, and extract at least some of the light through a face of the one or more first waveguides between the first and second edges. The eyepiece also includes a second waveguide positioned to receive light exiting the one or more first waveguides at the second edge and guide the received light to one or more light absorbers.

2021034, Nov 4, 2021

Jul 19, 2021

17/379895

- Plantation FL, US
Mauro Melli - San Leandro CA, US
Christophe Peroz - San Francisco CA, US
Vikramjit Singh - Pflugerville TX, US
Frank Xu - Austin TX, US
Michael Anthony Klug - Austin TX, US

G02F 1/1347
G02F 1/29
G02B 5/18
B81C 1/00
G02B 5/30
G02B 3/00

An optical device includes a liquid crystal layer having a first plurality of liquid crystal molecules arranged in a first pattern and a second plurality of liquid crystal molecules arranged in a second pattern. The first and the second pattern are separated from each other by a distance of about 20 nm and about 100 nm along a longitudinal or a transverse axis of the liquid crystal layer. The first and the second plurality of liquid crystal molecules are configured as first and second grating structures that can redirect light of visible or infrared wavelengths.

2021003, Feb 4, 2021

Oct 16, 2020

17/072998

- Austin TX, US
Christophe Peroz - San Francisco CA, US
Vikramjit Singh - Pflugerville TX, US
Frank Y. Xu - Austin TX, US

B29D 11/00
G02B 1/04
B29C 33/62

Fabricating a high refractive index photonic device includes disposing a polymerizable composition on a first surface of a first substrate and contacting the polymerizable composition with a first surface of a second substrate, thereby spreading the polymerizable composition on the first surface of the first substrate. The polymerizable composition is cured to yield a polymeric structure having a first surface in contact with the first surface of the first substrate, a second surface opposite the first surface of the polymeric structure and in contact with the first surface of the second substrate, and a selected residual layer thickness between the first surface of the polymeric structure and the second surface of the polymeric structure in the range of 10 μm to 1 cm. The polymeric structure is separated from the first substrate and the second substrate to yield a monolithic photonic device having a refractive index of at least 1.6.

2020004, Feb 13, 2020

Oct 10, 2019

16/598868

- Plantation FL, US
Christophe Peroz - San Francisco CA, US
Vikramjit Singh - Pflugerville TX, US

C03C 15/00
F21V 8/00
G06F 1/16
C03C 3/097

Plasma etching processes for forming patterns in high refractive index glass substrates, such as for use as waveguides, are provided herein. The substrates may be formed of glass having a refractive index of greater than or equal to about 1.65 and having less than about 50 wt % SiO. The plasma etching processes may include both chemical and physical etching components. In some embodiments, the plasma etching processes can include forming a patterned mask layer on at least a portion of the high refractive index glass substrate and exposing the mask layer and high refractive index glass substrate to a plasma to remove high refractive index glass from the exposed portions of the substrate. Any remaining mask layer is subsequently removed from the high refractive index glass substrate. The removal of the glass forms a desired patterned structure, such as a diffractive grating, in the high refractive index glass substrate.

2020004, Feb 6, 2020

Oct 8, 2019

16/596630

- Plantation FL, US
Mauro Melli - San Leandro CA, US
Vikramjit Singh - Pflugerville TX, US
David Jurbergs - Austin TX, US
Jeffrey Dean Schmulen - Austin TX, US
Zongxing Wang - Austin TX, US
Shuqiang Yang - Austin TX, US
Frank Y. Xu - Austin TX, US
Kang Luo - Austin TX, US
Marlon Edward Menezes - Austin TX, US
Michael Nevin Miller - Austin TX, US

Magic Leap, Inc. - Plantation FL

F21V 8/00
G02B 27/01
G02B 7/00
G06F 3/01
G06F 3/147
G09G 3/00
G09G 3/20
G02B 5/30
G02B 27/00
G02B 27/28
G02B 27/10
H04N 9/31
G02C 5/16
G02C 11/00
G06F 1/16
G06F 1/20
H05K 7/20
G02B 5/18

A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region.

2018018, Jul 5, 2018

Jan 4, 2018

15/862078

- Plantation FL, US
Christophe Peroz - San Francisco CA, US
Vikramjit Singh - Pflugerville TX, US

C03C 15/00
F21V 8/00
G06F 1/16

Plasma etching processes for forming patterns in high refractive index glass substrates, such as for use as waveguides, are provided herein. The substrates may be formed of glass having a refractive index of greater than or equal to about 1.65 and having less than about 50 wt % SiO. The plasma etching processes may include both chemical and physical etching components. In some embodiments, the plasma etching processes can include forming a patterned mask layer on at least a portion of the high refractive index glass substrate and exposing the mask layer and high refractive index glass substrate to a plasma to remove high refractive index glass from the exposed portions of the substrate. Any remaining mask layer is subsequently removed from the high refractive index glass substrate. The removal of the glass forms a desired patterned structure, such as a diffractive grating, in the high refractive index glass substrate.

2018014, May 24, 2018

Oct 26, 2017

15/795067

- Plantation FL, US
Mauro Melli - San Leandro CA, US
Christophe Peroz - San Francisco CA, US
Vikramjit Singh - Pflugerville TX, US
Frank Xu - Austin TX, US
Michael Anthony Klug - Austin TX, US

G02F 1/1347

An optical device includes a liquid crystal layer having a first plurality of liquid crystal molecules arranged in a first pattern and a second plurality of liquid crystal molecules arranged in a second pattern. The first and the second pattern are separated from each other by a distance of about 20 nm and about 100 nm along a longitudinal or a transverse axis of the liquid crystal layer. The first and the second plurality of liquid crystal molecules are configured as first and second grating structures that can redirect light of visible or infrared wavelengths.

2018005, Mar 1, 2018

Aug 23, 2017

15/684530

- Austin TX, US
Christophe Peroz - San Francisco CA, US
Vikramjit Singh - Pflugerville TX, US
Frank Y. Xu - Austin TX, US

B29D 11/00
G02B 1/04
B29C 33/62

Fabricating a high refractive index photonic device includes disposing a polymerizable composition on a first surface of a first substrate and contacting the polymerizable composition with a first surface of a second substrate, thereby spreading the polymerizable composition on the first surface of the first substrate. The polymerizable composition is cured to yield a polymeric structure having a first surface in contact with the first surface of the first substrate, a second surface opposite the first surface of the polymeric structure and in contact with the first surface of the second substrate, and a selected residual layer thickness between the first surface of the polymeric structure and the second surface of the polymeric structure in the range of 10 μm to 1 cm. The polymeric structure is separated from the first substrate and the second substrate to yield a monolithic photonic device having a refractive index of at least 1.6.