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Vincent Fry1010 S 9Th Ave, Arcadia, CA 91006

Vincent Fry Phones & Addresses

1010 9Th Ave, Arcadia, CA 91006    626-4453523   

4280 Via Arbolada, Los Angeles, CA 90042    323-4789880   

Monrovia, CA   

Big Bear City, CA   

1010 S 9Th Ave, Arcadia, CA 91006   

Mentions for Vincent Fry

Publications & IP owners

Us Patents

Methods And Apparatus For Controlled Chemical Vapor Deposition

US Patent:
8372482, Feb 12, 2013
Filed:
Feb 27, 2009
Appl. No.:
12/395414
Inventors:
Vincent Fry - Duarte CA, US
Assignee:
Goodrich Corporation - Charlotte NC
International Classification:
B23P 19/10
C23C 16/00
US Classification:
42725528, 29525
Abstract:
A gas injector system is provided that allows for improved distribution and directional control of the vapor material in a CVD or CVI process. Gas injector systems may be used without experiencing significant clogging of gas injector tube apertures over multiple CVD procedures. Further, a gas injector system include a dual aperture release system and/or allow vapor material to flow both substantially horizontally and substantially vertically.

Methods And Apparatus Relating To A Composite Material

US Patent:
2010017, Jul 15, 2010
Filed:
Jan 12, 2009
Appl. No.:
12/352431
Inventors:
Vincent Fry - Duarte CA, US
Ron Kestler - Redondo Beach CA, US
Andy Lazur - Huntington Beach CA, US
Assignee:
GOODRICH CORPORATION - Charlotte NC
International Classification:
C03C 14/00
US Classification:
501 35, 501 90
Abstract:
A composite material having a fibrous structure and a coating is disclosed. More specifically, a composite material may be comprised of a fibrous structure having a surface and impregnated with a interface material, a first ceramic material, a ceramic mixture, and a third ceramic material or alloy material or combination thereof, a coating disposed on the surface of the fibrous structure, wherein the coating comprises a first ceramic coating material and a ceramic coating mixture.

Methods And Apparatus For Controlled Chemical Vapor Deposition

US Patent:
2012029, Nov 22, 2012
Filed:
Jul 30, 2012
Appl. No.:
13/561965
Inventors:
Vincent Fry - Duarte CA, US
Assignee:
Goodrich Corporation - Charlotte NC
International Classification:
C23C 16/455
US Classification:
118715
Abstract:
A gas injector system is provided that allows for improved distribution and directional control of the vapor material in a CVD or CVI process. Gas injector systems may be used without experiencing significant clogging of gas injector tube apertures over multiple. CVD procedures. Further, a gas injector system provided includes a dual aperture release system and/or allow vapor material to flow both substantially horizontally and substantially vertically.

Methods And Apparatus For Controlled Chemical Vapor Deposition

US Patent:
2019036, Nov 28, 2019
Filed:
Aug 6, 2019
Appl. No.:
16/532747
Inventors:
- Charlotte NC, US
Vincent Fry - Duarte CA, US
Assignee:
Goodrich Corporation - Charlotte NC
International Classification:
C23C 16/455
C23C 16/04
Abstract:
A gas injector system is provided that allows for improved distribution and directional control of the vapor material in a CVD or CVI process. Gas injector systems may be used without experiencing significant clogging of gas injector tube apertures over multiple CVD procedures. Further, a gas injector system provided includes a dual aperture release system and/or allow vapor material to flow both substantially horizontally and substantially vertically.

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