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Vincent Leon, 43248 Mccaslin Blvd UNIT 106, Louisville, CO 80027

Known as:
Vince Leon Leon Vincent
Related to:
Sandra Garcia 33 Delores M Deleon 84

Vincent Leon Phones & Addresses

Louisville, CO   

14356 Layton Ave, Aurora, CO 80015    303-6808888   

Centennial, CO   

Avondale, AZ   

Boulder, CO   

Maricopa, AZ   

Louisville, CO   

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Mentions for Vincent Leon

Vincent Leon resumes & CV records

Resumes

Vincent Leon Photo 31

Lead Instrumentation Technician

Location:
Denver, CO
Work:

Lead Instrumentation Technician
Education:
Louisiana Technical College - Ascension Campus 2017 - 2018
Vincent Leon Photo 32

Company Owner

Location:
Denver, CO
Industry:
Maritime
Work:
Island Development Company 2011 - 2012
Marine Superintendent Vdl Marine Services 2011 - 2012
Company Owner
Skills:
Yachting, Maritime Operations, Ports, Maritime, Boat, Shipping, Logistics, Contract Negotiation, International Trade, Marine Engineering, Operations Management, Container, Export, International Logistics, Ocean, Customs Regulations, Ism, International Shipping, Import
Vincent Leon Photo 33

Senior Systems Administrator

Location:
Denver, CO
Industry:
Internet
Work:
Gearhost
Senior Systems Administrator
Vincent Leon Photo 34

Systems Administrator

Location:
63 Inverness Dr east, Englewood, CO 80112
Industry:
Computer & Network Security
Work:
Gearhost
Systems Administrator
Vincent Leon Photo 35

Pricing Coordinator

Location:
Aurora, CO
Industry:
Information Technology And Services
Work:
Southern Wine & Spirits
Pricing Coordinator
Vincent Leon Photo 36

Vincent Leon

Publications & IP owners

Us Patents

Non-Corrosive Cleaning Compositions For Removing Etch Residues

US Patent:
7935665, May 3, 2011
Filed:
Apr 24, 2003
Appl. No.:
10/421506
Inventors:
Vincent G. Leon - Scottsdale AZ, US
Michelle Elderkin - Coventry RI, US
Lawrence Ferreira - Fall River MA, US
Assignee:
Fujifilm Electronic Materials U.S.A., Inc. - North Kingstown RI
International Classification:
C11D 1/00
C11D 3/20
C11D 3/26
C11D 3/43
US Classification:
510176, 510175, 510245, 510255, 510258, 510477, 510488, 510505, 510506
Abstract:
A non-corrosive cleaning composition that is aqueous-based, non-hazardous and will not harm the environment and is useful primarily for removing both fresh and aged plasma etch residues from a substrate. The composition comprises (a) water; and (b) a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid. Preferably, the at least one carboxylic acid has a pKa value ranging from 3 to 6. Also, a method for removing etch residues from a substrate. The method includes the steps of (a) providing a substrate with etch residue; and (b) contacting the substrate with a cleaning composition comprising water; and a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid.

Cleaning Composition And Method For Removing Residues

US Patent:
6030932, Feb 29, 2000
Filed:
May 19, 1998
Appl. No.:
9/081840
Inventors:
Vincent G. Leon - Scottsdale AZ
Kenji Honda - Barrington RI
Eugene F. Rothgery - North Branford CT
Assignee:
Olin Microelectronic Chemicals - Norwalk CT
International Classification:
C11D 162
C11D 330
C11D 324
C11D 708
US Classification:
510175
Abstract:
Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound;(ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.

Cleaning Composition And Method For Removing Residues

US Patent:
6191086, Feb 20, 2001
Filed:
Dec 15, 1999
Appl. No.:
9/464485
Inventors:
Vincent G. Leon - Scottsdale AZ
Kenji Honda - Barrington RI
Eugene F. Rothgery - North Branford CT
Assignee:
Arch Specialty Chemicals, Inc. - Norwalk CT
International Classification:
C11D 162
C11D 330
C11D 324
US Classification:
510175
Abstract:
Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound; (ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.

Method For Removing Photoresist And Plasma Etch Residues

US Patent:
6245155, Jun 12, 2001
Filed:
Apr 6, 1998
Appl. No.:
9/055630
Inventors:
Vincent G. Leon - Scottsdale AZ
Kenji Honda - Barrington RI
Eugene F. Rothgery - North Branford CT
Assignee:
Arch Specialty Chemicals, Inc. - Norwalk CT
International Classification:
C23G 102
US Classification:
134 3
Abstract:
A method for the removing of plasma etch residues on a substrate comprising the steps of: (i) contacting the substrate with a cleaning composition, and (ii) contacting the substrate with ozonated water. The preferred cleaning composition has a pH from 2 to 6 and comprises: (A) water; (B) at least one selected hydroxylammonium compound; and (C) at least one basic compound; and optionally (D) a chelating stabilizer; and optionally (E) a surfactant.

Public records

Vehicle Records

Vincent Leon

Address:
4426 S Jebel Ln, Centennial, CO 80015
VIN:
WBAVD53567AV14774
Make:
BMW
Model:
3 SERIES
Year:
2007

Possible Relatives

Cynthia F Leon  David Leon  Dawn A Leon  Damaris G Leon  Damian Leon  Deborah L Leon  Dan E Leon  Vincent G Johnson  Vincent R Stanbro  Vincent Johnston 

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