Vincent P Wong, 6214379 El Contento Ave, Fontana, CA 92337

7028696, Apr 18, 2006

May 3, 2002

10/139042

Brett C. Richardson - San Ramon CA, US
Vincent Wong - Pleasanton CA, US

Lam Research Corporation - Fremont CA

B08B 7/04

134 11, 134 1, 134 221, 134 2218, 134 26, 134 30, 438905

A method involving plasma cleaning of deposit residues in process chamber using duo-step wafer-less auto clean method is detailed. Specifically, the method involves cleaning the processing chamber by flowing a first gaseous composition with at least about 75% of fluorine-containing compound of the formula XF, into a processing chamber and then forming a first etchant plasma which removes silicon and silicon based byproducts from the interior surfaces of the processing chamber. The method then involves flowing a second gaseous composition into the processing chamber with a composition of at least about 50% Oand forming a plasma from the second gaseous composition to provide a second etchant plasma which removes carbon and carbon based byproducts from the interior surfaces of the processing chamber. A system configured to execute the two step cleaning process is also provided.

7347090, Mar 25, 2008

Sep 14, 2006

11/532027

David G Childers - Long Beach CA, US
Ashwani K Chaudhary - Cypress CA, US
Viet H Nguyen - Cerritos CA, US
David Poladian - Carlsbad CA, US
Hoi T Tran - Tustin CA, US
Vincent L Wong - Irvine CA, US
Michael J Zyss - Hacienda Heights CA, US

The Boeing Company - Chicago IL

G06F 19/00

7317002, 701 4

Methods and systems for calculating atmospheric vehicle air data are disclosed. In one embodiment, a method of calculating air data includes acquiring one or more pressure measurements at locations on an outer surface of the aircraft; acquiring one or more measurements using an alternate navigation device; computing an indicated air data solution using the one or more measurements obtained using the alternate navigation device and an atmospheric model; computing corrections to the indicated air data solution using one or more other measured parameters, wherein the one or more other measured parameters include at least one of the one or more pressure measurements and the one or more measurements obtained using the alternate navigation device; determining a corrected air data solution using the indicated air data solution and the corrections; and providing the corrected air data solution for use in controlling the aircraft.

7635408, Dec 22, 2009

Aug 18, 2004

10/585271

John Mak - Santa Ana CA, US
Richard B. Nielsen - Laguna Niguel CA, US
Thomas King Chow - Villa Park CA, US
Oliver Morgan - Huntington Beach CA, US
Vincent Wai Wong - Hacienda Heights CA, US

Fluor Technologies Corporation - Aliso Viejo CA

B01D 53/14

95187, 95223, 95235, 96234, 423220, 208208 R

Hydrogen sulfide is selectively enriched from an acid gas () that comprises relatively large quantities of carbon dioxide using a configuration in which a portion of an isolated hydrogen sulfide stream is introduced into an absorber () operating as a carbon dioxide rejecter. The resulting concentrated hydrogen sulfide enriched solvent () is then further used (directly or indirectly) to absorb hydrogen sulfide from an acid feed gas.

7648692, Jan 19, 2010

Apr 22, 2004

11/568009

Thomas King Chow - Irvine CA, US
John Gebur - El Monte CA, US
Satish Reddy - Irvine CA, US
Vincent Wai Wong - Hacienda Heights CA, US

Fluor Technologies Corporation - Aliso Viejo CA

B01J 12/02
C01B 17/04

4235741, 422188, 422189, 422190, 422191, 422193, 422194

Carbonyl sulfide (COS) from a COS-containing stream () is convened in a Claus plant () to elemental sulfur () by oxidation of a first portion of the COS-containing stream to SOand by hydrolysis of a second portion of the COS-containing stream to HS. In preferred aspects of the inventive subject matter, hydrolysis and/or oxidation of the COS is performed in the reactor furnace (), while hydrolysis of the COS is performed in the reactor furnace (), a hydrolysis reactor, and/or a catalytic converter ().

7910077, Mar 22, 2011

Oct 20, 2005

11/718684

Thomas King Chow - Irvine CA, US
Vincent Wai Wong - Hacienda Heights CA, US
John Gebur - El Monte CA, US

Fluor Technologies Corporation - Aliso Viejo CA

B01D 53/46
B01J 19/00
C01B 17/02

423219, 4232421, 42324401, 42324409, 4232441, 422168, 422169, 422170, 422171, 422177, 422180

Sulfur oxides are removed from an oxygen-containing acid gas in configurations and methods in which oxygen is removed from the acid gas using reducing gases at relatively high temperature. The so treated acid gas is then fed to a direct reduction reactor in which the sulfur species are converted to elemental sulfur. Contemplated configurations are particularly effective and economically attractive as they are generally not limited by reaction equilibrium as present in a Claus reaction and do not require solvent and solvent-associated equipment.

8178070, May 15, 2012

Jun 19, 2008

12/664563

Vincent Wai Wong - Hacienda Heights CA, US
Thomas King Chow - Irvine CA, US
John Gebur - El Monte CA, US

Fluor Technologies Corporation - Aliso Viejo CA

C01B 17/04
G05D 7/00

4235741, 4235731, 422110, 422111, 422112, 422168, 422182

A Claus plant with multiple parallel thermal stages that provide a combined effluent to downstream catalytic stages includes a controller that allows independent and individual control for each of the thermal stages as a function of measured chemical composition of the thermal stage effluents and catalytic stage effluent.

8557206, Oct 15, 2013

Apr 22, 2004

11/568010

Thomas King Chow - Irvine CA, US
Vincent Wai Wong - Hacienda Heights CA, US

Fluor Technologies Corporation - Aliso Viejo CA

B01D 53/50
C01B 17/16

423224, 422170, 422171, 42324409, 423564

Methods and configurations are drawn to a plant in which an effluent gas () comprising oxygen and sulfur dioxide is catalytically reacted with hydrogen sulfiden () and hydrogen and/or carbon monoxide () to form a treated gas that is substantially oxygen free and in which sulfur dioxide is converted to hydrogen sulfide. In most preferred aspects, the hydrogen sulfide is provided to the process via a recycle loop (B).

2006013, Jun 22, 2006

Dec 23, 2005

11/318122

Brett Richardson - San Ramon CA, US
Vincent Wong - Pleasanton CA, US

LAM RESEARCH CORPORATION - FREMONT CA

B08B 6/00

134001100, 156345240

A method involving plasma cleaning of deposit residues in process chamber using duo-step wafer-less auto clean method is detailed. Specifically, the method involves cleaning the processing chamber by flowing a first gaseous composition with at least about 75% of fluorine-containing compound of the formula XF, into a processing chamber and then forming a first etchant plasma which removes silicon and silicon based byproducts from the interior surfaces of the processing chamber. The method then involves flowing a second gaseous composition into the processing chamber with a composition of at least about 50% Oand forming a plasma from the second gaseous composition to provide a second etchant plasma which removes carbon and carbon based byproducts from the interior surfaces of the processing chamber. A system configured to execute the two step cleaning process is also provided.