William P Willen Deceased39 Sagebrush Ln, Covington, KY 41018

6589351, Jul 8, 2003

Jul 24, 2000

09/624808

Robert William Bruce - Loveland OH
Antonio Frank Maricocchi - Loveland OH
John Douglas Evans, Sr. - Springfield OH
Rudolfo Viguie - Cincinnati OH
David Vincent Rigney - Cincinnati OH
David John Wortman - Niskayuna NY
William Seth Willen - Glastonbury CT

General Electric Company - Schenectady NY

C23C 1600

118726, 118723 EB, 118728, 118724

An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e. g. , a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion of a crucible that supports the coating material and is configured to be efficiently cooled so as to reduce the rate at which the process temperature increases within the coating chamber.

6863937, Mar 8, 2005

Nov 19, 2002

10/299646

Robert William Bruce - Loveland OH, US
Antonio Frank Maricocchi - Loveland OH, US
Christopher Lee Lagemann - Cincinnati OH, US
John Douglas Evans, Sr. - Springfield OH, US
Keith Humphries Betscher - West Chester OH, US
Rudolfo Viguie - Cincinnati OH, US
David Vincent Rigney - Cincinnati OH, US
David John Wortman - Niskayuna NY, US
William Seth Willen - Glastonbury CT, US

General Electric Company - Schenectady NY

C23C014/30

427566, 427596, 42725532

An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e. g. , a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion or adaptation of one or more mechanical and/or process modifications, including those necessary or beneficial when operating the apparatus at coating pressures above 0. 010 mbar.

6946034, Sep 20, 2005

Aug 19, 2003

10/643262

Robert William Bruce - Loveland OH, US
Antonio Frank Maricocchi - Loveland OH, US
Christopher Lee Lagemann - Cincinnati OH, US
John Douglas Evans, Sr. - Springfield OH, US
Keith Humphries Betscher - West Chester OH, US
Rudolfo Viguie - Cincinnati OH, US
David Vincent Rigney - Cincinnati OH, US
David John Wortman - Niskayuna NY, US
William Seth Willen - Glastonbury CT, US

General Electric Company - Schenectady NY

C23C014/00

118719, 118723 EB, 118726

An electron beam physical vapor deposition (EBPVD) apparatus for producing a coating material (e. g. , a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber through an aperture in a wall of the chamber and onto a coating material within a coating region defined within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion within the coating chamber of a second chamber that encloses the aperture so as to separate the aperture from the coating region. The second chamber is maintained at a pressure lower than the coating region.