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Xiaomin LiuCampbell, CA

Related to:
Zhao Qing Liu 47 Brigido Contreras 98 Shi Kun Liu 61 Huimin Li Feng L Li

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Campbell, CA   

Santa Clara, CA   

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Resumes

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Senior Research Scientist

Location:
Santa Clara, CA
Industry:
Computer Software
Work:
Black Sesame Technologies Inc
Senior Research Scientist Hologic, Inc.
Senior Scientist University of Notre Dame Oct 2011 - Apr 2012
Research Assistant Professor Hologic, Inc. Oct 2011 - Apr 2012
Computer Vision Scientist University of Notre Dame Aug 2006 - Aug 2011
Research Assistant Tsinghua University Mar 2003 - Jul 2003
Research Assistant
Education:
University of Notre Dame 2006 - 2011
Doctorates, Doctor of Philosophy, Computer Science, Engineering, Computer Science and Engineering Tsinghua University 2003 - 2006
Master of Science, Masters, Electrical Engineering Tsinghua University 1999 - 2003
Bachelors, Bachelor of Science, Electrical Engineering University of Michigan - Flint
Bachelors, Bachelor of Business Administration
Skills:
Graph Search Based Image Segmentation, Image Classification, Object Detection, Face Detection, Facial Expression Recognition, C++, Image Processing, Itk, Matlab, Confocal Microscopy, Algorithms, Machine Learning, Medical Imaging, Biomedical Engineering, C, Pattern Recognition, Java
Xiaomin Liu Photo 31

Xiaomin Cindy Liu

Skills:
Teaching, Microsoft Office, Early Childhood, Public Speaking, Time Management, Early Childhood Education
Xiaomin Liu Photo 32

Xiaomin Liu

Xiaomin Liu Photo 33

Xiaomin Liu

Skills:
Firmware, Software, Lei
Xiaomin Liu Photo 34

Xiaomin Liu

Xiaomin Liu Photo 35

Xiaomin Liu

Publications & IP owners

Us Patents

Process Of Making Cd Uniformity In High Track Density Recording Head

US Patent:
7293344, Nov 13, 2007
Filed:
Jul 8, 2004
Appl. No.:
10/886888
Inventors:
Laurie Lauchlan - Saratoga CA, US
Xiaomin Liu - Milpitas CA, US
Assignee:
Headway Technologies, Inc. - Milpitas CA
International Classification:
G11B 5/127
B44C 1/22
US Classification:
2960313, 2960314, 2960312, 360119, 360122, 360125, 427130, 2041921, 20419234
Abstract:
A process for achieving tighter reader and writer track width control is disclosed. The write gap layer is used as the plating seed on which the upper pole is electro-formed. This allows the write gap layer to then be deposited through a precisely controllable process such as sputtering. Since less material needs to be removed during pole trimming, a thinner layer of photoresist may be used, resulting in improved dimensional control.

Electroplated Magnetic Film For Read-Write Applications

US Patent:
8118990, Feb 21, 2012
Filed:
May 10, 2006
Appl. No.:
11/431261
Inventors:
Xiaomin Liu - Fremont CA, US
Feiyue Li - Fremont CA, US
Assignee:
Headway Technologies, Inc. - Milpitas CA
International Classification:
C25D 3/56
US Classification:
205259, 205255
Abstract:
A process is described for the fabrication, through electrodeposition, of FeCoNi(x=60-71, y=25-35, z=0-5) films that have, in their as-deposited form, a saturation magnetization of at least 24 kG and a coercivity of less than 0. 3 Oe. A key feature is the addition of aryl sulfinates to the plating bath along with a suitable seed layer.

Electrodeposition Of Feconiv Films With High Resistivity And High Saturation Magnetization For Magnetic Head Fabrication

US Patent:
8177955, May 15, 2012
Filed:
Jun 3, 2004
Appl. No.:
10/860716
Inventors:
Feiyue Li - Fremont CA, US
Xiaomin Liu - Milpitas CA, US
Assignee:
Headway Technologies, Inc. - Milpitas CA
International Classification:
C25D 3/56
US Classification:
205255, 205119
Abstract:
A magnetic layer that may serve as a top pole layer and bottom pole layer in a magnetic write head is disclosed. The magnetic layer has a composition represented by FeCoNiVin which w, x, y, and z are the atomic % of Fe, Co, Ni, and V, respectively, and where w is between about 60 and 85, x is between about 10 and 30, y is between 0 and about 20, z is between about 0. 1 and 3, and wherein w+x+y+z=100. An electroplating process having a plating current density of 3 to 30 mA/cmis used to deposit the magnetic layer and involves an electrolyte solution with a small amount of VOSOwhich is the V source. The resulting magnetic layer has a magnetic saturation flux density Bgreater than 1. 9 Telsa and a resistivity ρ higher than 70 μohms-cm.

Laminated High Moment Film For Head Applications

US Patent:
8329320, Dec 11, 2012
Filed:
Nov 13, 2008
Appl. No.:
12/291715
Inventors:
Kunliang Zhang - Fremont CA, US
Min Li - Dublin CA, US
Min Zheng - Milpitas CA, US
Fenglin Liu - Milpitas CA, US
Xiaomin Liu - Fremont CA, US
Assignee:
Headway Technologies, Inc. - Milpitas CA
International Classification:
G11B 5/31
G11B 5/127
US Classification:
428812, 428815, 360324, 360325, 36012501
Abstract:
A laminated high moment film with a non-AFC configuration is disclosed that can serve as a seed layer for a main pole layer or as the main pole layer itself in a PMR writer. The laminated film includes a plurality of (B/M) stacks where B is an alignment layer and M is a high moment layer. Adjacent (B/M) stacks are separated by an amorphous layer that breaks the magnetic coupling between adjacent high moment layers and reduces remanence in a hard axis direction while maintaining a high magnetic moment and achieving low values for Hch, Hce, and Hk. The amorphous material layer may be made of an oxide, nitride, or oxynitride of one or more of Hf, Zr, Ta, Al, Mg, Zn, Ti, Cr, Nb, or Si, or may be Hf, Zr, Ta, Nb, CoFeB, CoB, FeB, or CoZrNb. Alignment layers are FCC soft ferromagnetic materials or non-magnetic FCC materials.

Electrodeposition Of Feconiv Films With High Resistivity And High Saturation Magnetization

US Patent:
8568909, Oct 29, 2013
Filed:
May 11, 2012
Appl. No.:
13/469856
Inventors:
Feiyue Li - Fremont CA, US
Xiaomin Liu - Milpitas CA, US
Assignee:
Headway Technologies, Inc. - Milpitas CA
International Classification:
G11B 5/127
G11B 5/187
G11B 5/31
C22C 38/10
C22C 38/12
US Classification:
428812, 428816, 36012506, 3601253, 36012543, 36012571, 360128
Abstract:
A magnetic layer that may serve as a top pole layer and bottom pole layer in a magnetic write head is disclosed. The magnetic layer has a composition represented by FeCoNiVin which w, x, y, and z are the atomic % of Fe, Co, Ni, and V, respectively, and where w is between about 60 and 85, x is between about 10 and 30, y is between 0 and about 20, z is between about 0. 1 and 3, and wherein w+x+y+z=100. An electroplating process having a plating current density of 3 to 30 mA/cmis used to deposit the magnetic layer and involves an electrolyte solution with a small amount of VOSOwhich is the V source. The resulting magnetic layer has a magnetic saturation flux density Bgreater than 1. 9 Telsa and a resistivity ρ higher than 70 μohms-cm.

Pole Piece For High Track Density Recording

US Patent:
2005018, Aug 18, 2005
Filed:
Feb 17, 2004
Appl. No.:
10/780514
Inventors:
Lei Zhang - San Jose CA, US
Xiaomin Liu - Milpitas CA, US
International Classification:
G11B005/147
US Classification:
360126000
Abstract:
For high track density recording, tighter reader and writer track width control are essential. This has been achieved by using a plated NiPd write gap which is self-aligned with a plated 23 KG pole material. Heat dissipation by the writer is thus improved since alumina has been replaced with nonmagnetic metal materials, such as Ru, leading to less pole tip protrusion which in turn leads to better writer track width control

High Track Density Recording Head

US Patent:
2008005, Mar 6, 2008
Filed:
Oct 23, 2007
Appl. No.:
11/975955
Inventors:
Laurie Lauchlan - Saratoga CA, US
Xiaomin Liu - Milpitas CA, US
International Classification:
G11B 5/127
G11B 5/33
US Classification:
360319000
Abstract:
For high track density recording, tighter reader and writer track width control are essential. This has been achieved by using the write gap layer as the plating seed on which the upper pole was electro-formed so that the width of the GMR pedestal serves to define the device's write track width.

Method To Make Superior Soft (Low Hk), High Moment Magnetic Film And Its Application In Writer Heads

US Patent:
2008019, Aug 21, 2008
Filed:
Feb 16, 2007
Appl. No.:
11/707826
Inventors:
Xiaomin Liu - Fremont CA, US
Feiyue Li - Fremont CA, US
International Classification:
C25D 5/50
US Classification:
205 90, 148108
Abstract:
A process sequence for forming a soft magnetic layer having Hce and Hch of ≦2 Oe, Hk≦5 Oe, and Bs of ≧24 kG is disclosed. A CoFe or CoFe alloy is electroplated in a 10C to 25C. bath (pH 2 to 3) containing Coand Feions in addition to boric acid and one or more aryl sulfinate salts to promote magnetic softness in the deposited layer. Peak current density is 30 to 60 mA/cm. A two step magnetic anneal process is performed to further improve softness. An easy axis anneal is followed by a hard axis anneal or vice versa. In an embodiment where the magnetic layer is a pole layer in a write head, the temperature is maintained in a 180C to 250C range and the applied magnetic field is kept a 300 Oe or below to prevent degradation of an adjacent read head.

Amazon

Xiaomin Liu Photo 36

Privacy-Preserving Two-Party Protocols.

Author:
Xiaomin Liu
Publisher:
ProQuest, UMI Dissertation Publishing
Binding:
Paperback
Pages:
182
ISBN #:
1244579114
EAN Code:
9781244579118
Enjoy a wide range of dissertations and theses published from graduate schools and universities from around the world. Covering a wide range of academic topics, we are happy to increase overall global access to these works and make them available outside of traditional academic databases. These work...
Xiaomin Liu Photo 37

Wto Yu Zhongguo Wen Hua =: Wto And Chinese Culture (Mandarin Chinese Edition)

Author:
Xiaomin Liu
Publisher:
Guangdong jing ji chu ban she
Binding:
Unknown Binding
Pages:
371
ISBN #:
7806328084
EAN Code:
9787806328088

Possible Relatives

Cynthia S Liu  David Y Liu  Dean Liu  Da J Liu  Debbie Y Liu  Dan Liu  Xiaomin Xu  Xiaomin Chen  Xiaomin Huang 

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