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Tao Sheng, 651980 Wayne Ave, San Jose, CA 95131

Tao Sheng Phones & Addresses

1980 Wayne Ave, San Jose, CA 95131    408-5771588    408-9438916   

1436 Pomona Ave, San Jose, CA 95110   

42864 Mission Rd, Fremont, CA 94539    510-3531554   

355 S 50Th St, Richmond, CA 94804   

18 Sheffield Ct, San Pablo, CA 94806   

Concord, CA   

Melissa, TX   

Colton, TX   

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Tao Sheng

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Tao Sheng

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Tao Sheng Photo 19

Tao Sheng

Tao Sheng ( pinyin Do shng, ca. 360-434) was an eminent Li Cho era Chinese Buddhist scholar. Born in Pengcheng, he studied in Jiankang under Chu Fa-t'ai, and later at Lu ...
Tao Sheng Photo 20

Xiao Tao Sheng

Xiao Tao Sheng () (born 1946) is a Chinese painter who specializes in portraying Chinese culture through his Western-style oil paintings, called East in West paintings.

Us Patents

In Situ Film Growth Sensor Assembly, Apparatus, And Methods

US Patent:
2022037, Nov 24, 2022
Filed:
May 16, 2022
Appl. No.:
17/745361
Inventors:
- Santa Clara CA, US
Tao SHENG - Santa Clara CA, US
Xinning LUAN - Tempe AZ, US
Enle CHOO - Saratoga CA, US
Ala MORADIAN - Sunnyvale CA, US
International Classification:
H01L 21/66
H01L 21/67
Abstract:
Embodiments disclosed herein generally relate to in situ monitoring of film growth in processing chambers. In some examples, a sensor assembly for a processing chamber includes a sensor tube including silicon carbide and having an optical path therein and a sensor window including crystalline silicon carbide and having a proximal side coupled to a distal end of the sensor tube. The sensor window covers the optical path, and a distal side of the sensor window facing away from the proximal side is perpendicular to a center axis of the optical path.

In-Situ Film Growth Rate Monitoring Apparatus, Systems, And Methods For Substrate Processing

US Patent:
2022034, Nov 3, 2022
Filed:
Apr 28, 2021
Appl. No.:
17/243158
Inventors:
- Santa Clara CA, US
Nyi Oo MYO - San Jose CA, US
Tao SHENG - Santa Clara CA, US
Yong ZHENG - Dublin CA, US
International Classification:
C30B 25/16
C30B 23/00
C30B 25/12
C30B 25/10
C30B 23/06
C23C 14/54
C23C 16/46
C23C 16/52
C23C 16/458
C23C 14/50
G01N 21/55
Abstract:
Embodiments of the present disclosure generally relate to apparatus, systems, and methods for in-situ film growth rate monitoring. A thickness of a film on a substrate is monitored during a substrate processing operation that deposits the film on the substrate. The thickness is monitored while the substrate processing operation is conducted. The monitoring includes directing light in a direction toward a crystalline coupon. The direction is perpendicular to a heating direction. In one implementation, a reflectometer system to monitor film growth during substrate processing operations includes a first block that includes a first inner surface. The reflectometer system includes a light emitter disposed in the first block and oriented toward the first inner surface, and a light receiver disposed in the first block and oriented toward the first inner surface. The reflectometer system includes a second block opposing the first block.

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