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Beilei H Xu, 5464 Crestview Dr, Clinton, NJ 08809

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64 Crestview Dr, Clinton, NJ 08809   

Edison, NJ   

Piscataway, NJ   

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Degree: Graduate or professional degree

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Beilei Xu

Skills:
Sas, Sql, Clinical Trials, Edc, Sas Programming, Validation, Clinical Data Management
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Beilei Xu

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Beilei Xu

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Beilei Xu

Publications & IP owners

Us Patents

Selective Replacement For Artifact Reduction

US Patent:
6695435, Feb 24, 2004
Filed:
May 30, 2003
Appl. No.:
10/448135
Inventors:
Hui Cheng - Bridgewater NJ
Beilei Xu - Penfield NY
Elliott A. Eklund - Penfield NY
Assignee:
Xerox Corporation - Stamford CT
International Classification:
B41J 221
US Classification:
347 43, 347 19
Abstract:
Selective replacement methods and systems based on a stochastic process use a redundancy inherent, for example, in a four-plus color printing system that has full-width colors. Since the absorption spectra of the four or more colors usually overlap to some extent, there is a redundancy that can be used to reduce artifacts, such as streaks. Since the human visual system is much less sensitive to chrominance changes, than to luminance changes, matching the luminance of a pixel where a color is missing, to the luminance of the original color or to the luminance of the pixels that neighbor that pixel can adequately to reduce the severity of the artifact caused by the missing color while reducing the chance that the replacing process itself introduces any additional artifacts.

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