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Zhengmao Ye, 522220 Seven Wins Dr, Austin, TX 78733

Zhengmao Ye Phones & Addresses

2220 Seven Wins Dr, Austin, TX 78733   

5106 Lamar Blvd, Austin, TX 78751    512-3230352   

111 38Th St, Austin, TX 78705   

Harrison, NJ   

Hays, TX   

6913 Seneca Falls Ln, Austin, TX 78739   

Education

Degree: Graduate or professional degree

Mentions for Zhengmao Ye

Zhengmao Ye resumes & CV records

Resumes

Zhengmao Ye Photo 2

Director, Hdd Applications

Location:
Austin, TX
Industry:
Nanotechnology
Work:
Molecular Imprints, Inc.
Director, Hdd Applications
Zhengmao Ye Photo 3

Vp, Process Technology

Location:
1807 west Braker Ln, Austin, TX 78758
Industry:
Nanotechnology
Work:
Canon Nanotechnologies
Vp, Process Technology
Molecular Imprints, Inc. Apr 2011 - Apr 2014
Director, Applications
Molecular Imprints, Inc. Feb 2008 - Apr 2011
Manager, Hdd Applications
Nanocoolers Dec 2003 - Dec 2007
Member of Technical Staffs
Education:
The University of Texas at Austin 1998 - 2003
Doctorates, Doctor of Philosophy, Electrical Engineering
University of Toronto 1997 - 1998
Nanjing University 1990 - 1997
Master of Science, Masters, Physics
Skills:
Thin Films, Semiconductors, Nanotechnology, Mems, Metrology, Characterization, Materials Science, Semiconductor Industry
Zhengmao Ye Photo 4

Zhengmao Ye

Publications & IP owners

Us Patents

Thermoelectric Device Structure And Apparatus Incorporating Same

US Patent:
2006007, Apr 13, 2006
Filed:
May 6, 2005
Appl. No.:
11/124365
Inventors:
Uttam Ghoshal - Austin TX, US
Tat Ngai - Austin TX, US
Srikanth Samavedam - Austin TX, US
Zhengmao Ye - Austin TX, US
Andrew Miner - Austin TX, US
International Classification:
H01L 35/30
H01L 35/28
US Classification:
136205000, 136212000
Abstract:
In certain embodiments, a thermoelectric device apparatus includes a plurality of laterally spaced-apart electrodes disposed upon a supporting structure, and at least one complementary pair of thermoelectric elements, each thermoelectric element coupling an electrode to a laterally adjacent electrode. Such a structure reduces the need for solder joints or other structures or mechanisms to attach multiple substrates, components, or assemblies together to form a thermoelectric device.

Facilitating Adhesion Between Substrate And Patterned Layer

US Patent:
2010011, May 6, 2010
Filed:
Oct 27, 2009
Appl. No.:
12/606588
Inventors:
Edward B. Fletcher - Austin TX, US
Zhengmao Ye - Austin TX, US
Dwayne L. LaBrake - Cedar Park TX, US
Frank Y. Xu - Round Rock TX, US
Assignee:
MOLECULAR IMPRINTS, INC. - Austin TX
International Classification:
B05D 5/10
H05H 1/24
US Classification:
427569, 4272071
Abstract:
Systems and methods for adhering a substrate to a patterned layer are described. Included are in situ cleaning and conditioning of the substrate, and the application of an adhesion layer between the substrate and the patterned layer, as well as forming an intermediate layer between adhesion materials and the substrate.

Adhesion Layers In Nanoimprint Lithograhy

US Patent:
2011016, Jul 7, 2011
Filed:
Nov 24, 2010
Appl. No.:
12/954376
Inventors:
Zhengmao Ye - Austin TX, US
Frank Y. Xu - Round Rock TX, US
Dwayne L. LaBrake - Cedar Park TX, US
Kosta S. Selinidis - Austin TX, US
Assignee:
MOLECULAR IMPRINTS, INC. - Austin TX
International Classification:
B32B 7/12
B05D 5/10
B05D 3/12
US Classification:
428336, 427208, 427271
Abstract:
Forming an adhesive layer on a nanoimprint lithography template or a double-sided disk. Forming the adhesive layer on the double-sided disk includes immersing the double-sided disk in a liquid adhesive composition and removing the double-sided disk from the adhesive composition. The outer layer of the double-sided disk is a carbon overcoating or an intermediate layer. The adhesive composition is dried to form a first adhesion layer adhered directly to the carbon overcoating or intermediate layer on a first side of the disk and a second adhesion layer adhered directly to the carbon overcoating or intermediate layer on a second side of the disk. Forming the adhesive layer on the nanoimprint lithography template includes applying an adhesive material to the template, allowing the template to remain motionless, and rinsing a portion of the adhesive material from the template with a solvent, and drying the template.

Methods Of Cleaning Hard Drive Disk Substrates For Nanoimprint Lithography

US Patent:
2012005, Mar 8, 2012
Filed:
Sep 7, 2011
Appl. No.:
13/227205
Inventors:
Zhengmao Ye - Austin TX, US
Rick Ramos - El Paso TX, US
Assignee:
MOLECULAR IMPRINTS, INC. - Austin TX
International Classification:
G11B 5/84
B08B 1/00
B05D 3/12
B05D 3/10
B05D 3/00
B08B 3/12
B08B 3/08
US Classification:
427127, 134 1
Abstract:
Post sputter cleaning of hard disk substrates for use in an imprint lithography processes. The cleaning removes contaminants including organic contaminants that otherwise may cause repeating void (non-fill) defects in the imprinted pattern.

Vapor Delivery System For Use In Imprint Lithography

US Patent:
2012007, Mar 22, 2012
Filed:
Sep 8, 2011
Appl. No.:
13/228298
Inventors:
Zhengmao Ye - Austin TX, US
Rick Ramos - El Paso TX, US
Edward Brian Fletcher - Austin TX, US
Christopher Ellis Jones - Austin TX, US
Dwayne L. LaBrake - Cedar Park TX, US
Assignee:
MOLECULAR IMPRINTS, INC. - Austin TX
International Classification:
B05D 5/10
C23C 16/448
US Classification:
4272071, 118715
Abstract:
Described are systems and method of using a vapor delivery system for enabling delivery of an adhesion promoter material during an imprint lithography process.

Shaping System Including An Evaporation Cover, Shaping Process, And Method Of Manufacturing An Article

US Patent:
2023010, Apr 13, 2023
Filed:
Oct 11, 2021
Appl. No.:
17/498568
Inventors:
- Tokyo, JP
Alireza Aghili - Austin TX, US
Zhengmao Ye - Austin TX, US
International Classification:
B29C 43/10
B29C 43/02
B29C 43/20
B29C 43/34
B29C 43/18
Abstract:
A shaping system comprises a dispensing station configured to dispense formable material on a substrate, a shaping station configured to contact the dispensed formable material on the substrate with a plate, a positioning system configured to move the substrate having the dispensed formable material from the dispensing system to the shaping station, and a cover having one or more walls. While the substrate having the dispensed formable material is moved by the positioning system from the dispensing station to the shaping station, the cover is positioned to enclose the substrate and the dispensed formable material such that a ratio of a diameter of the substrate to a distance between the cover and the substrate to 80:1 to 30:1.

Liquid Charging Apparatus, Liquid Charging Method, And Manufacturing Method

US Patent:
2021002, Jan 28, 2021
Filed:
Jul 22, 2019
Appl. No.:
16/518754
Inventors:
- Tokyo, JP
Zhengmao Ye - Austin TX, US
International Classification:
B41J 2/085
B41J 2/135
Abstract:
An apparatus and method configured to eject an electrically charged liquid. The apparatus and method include a liquid-ejecting apparatus including a reservoir for storing a liquid, an electrically conductive faceplate for ejecting the liquid, a plurality of channels connecting the reservoir to the electrically conductive faceplate, and a voltage source to change and maintain an electric potential difference between the liquid and the electrically conductive faceplate during ejection from the electrically conductive faceplate.

Imprint System And Imprinting Process With Spatially Non-Uniform Illumination

US Patent:
2019017, Jun 13, 2019
Filed:
Dec 11, 2017
Appl. No.:
15/837898
Inventors:
- Tokyo, JP
Edward Brian Fletcher - Austin TX, US
Craig William Cone - Austin TX, US
Douglas J. Resnick - Leander TX, US
Zhengmao Ye - Austin TX, US
International Classification:
G03F 7/20
G03F 7/00
Abstract:
An imprinting system and method. An illumination system for imprinting, during a first period of time, that illuminates a first portion of boundary region that surrounds a pattern region with a thickening dosage of light that is within a first dose range, such that the fluid in the first portion of the boundary region does not solidify but does increase a viscosity of the fluid. The illumination system, during a second period of time, illuminates the pattern region with a curing dosage of light that is within a second dose range higher than the first dose range. Prior to illumination, the imprinting includes dispensing droplets and holding a template with a template chuck such that the template contact the droplets and the droplets merge and form a fluid front that spreads through the pattern region and towards the boundary region.

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