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Mukesh R Desai, 731097 Stratham Ct, Schaumburg, IL 60193

Known as:
Mukesg Desai Desai Mukesg
Related to:
Karen A Yoest 64 Anilkumar R Desai

Mukesh Desai Phones & Addresses

578 Mistic Harbour Ln, Schaumburg, IL 60193    847-3010915    847-4665810   

Bartlett, IL   

Lawrenceville, GA   

Roselle, IL   

Des Plaines, IL   

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Mentions for Mukesh R Desai

Career records & work history

Medicine Doctors

Mukesh I. Desai

Specialties:
Psychiatry
Work:
James Wright Center
1700 N Illinois St FL 2, Indianapolis, IN 46202
317-5545700 (phone) 317-5545711 (fax)
Education:
Medical School
Topiwala Nat'l Med Coll, Univ of Mumbai, Mumbai, Maharashtra, India
Graduated: 1978
Procedures:
Psychiatric Diagnosis or Evaluation, Psychiatric Therapeutic Procedures
Conditions:
Bipolar Disorder, Depressive Disorders, Schizophrenia, Anxiety Dissociative and Somatoform Disorders, Anxiety Phobic Disorders, Attention Deficit Disorder (ADD), Post Traumatic Stress Disorder (PTSD)
Languages:
English, Spanish
Description:
Dr. Desai graduated from the Topiwala Nat'l Med Coll, Univ of Mumbai, Mumbai, Maharashtra, India in 1978. He works in Indianapolis, IN and specializes in Psychiatry. Dr. Desai is affiliated with Eskenazi Health.

Mukesh B. Desai

Specialties:
Urology
Work:
Ohio County Specialty Care
1215 Old Main St, Hartford, KY 42347
270-2985417 (phone) 270-2985285 (fax)
Education:
Medical School
Seth G S Med Coll, Univ of Mumbai, Mumbai, Maharashtra, India
Graduated: 1980
Languages:
English, Spanish
Description:
Dr. Desai graduated from the Seth G S Med Coll, Univ of Mumbai, Mumbai, Maharashtra, India in 1980. He works in Hartford, KY and specializes in Urology. Dr. Desai is affiliated with Ohio County Hospital and Owensboro Health Regional Hospital.
Mukesh Desai Photo 1

Mukesh Indubhai Desai

Specialties:
Psychiatry
Child & Adolescent Psychiatry
Education:
Topiwala National Medical College (1978)
Mukesh Desai Photo 2

Mukesh Desai

Specialties:
Urology
Pediatric Urology
Internal Medicine
Education:
Seth G.S. Medical College (1980)

License Records

Mukesh Indubhai Desai Mbbs

Licenses:
License #: 15863 - Expired
Category: Medicine
Issued Date: Oct 26, 1981
Effective Date: Dec 9, 1988
Type: Physician

Mukesh Desai resumes & CV records

Resumes

Mukesh Desai Photo 38

Mukesh Desai

Location:
United States
Mukesh Desai Photo 39

Mukesh Desai

Location:
United States
Mukesh Desai Photo 40

Mukesh Desai

Location:
United States
Mukesh Desai Photo 41

Mukesh Desai

Location:
United States
Mukesh Desai Photo 42

Mukesh Desai

Location:
United States

Publications & IP owners

Us Patents

Silicon Carbide Polishing Method Utilizing Water-Soluble Oxidizers

US Patent:
7678700, Mar 16, 2010
Filed:
Sep 5, 2006
Appl. No.:
11/515546
Inventors:
Mukesh Desai - Naperville IL, US
Kevin Moeggenborg - Naperville IL, US
Phillip Carter - Round Lake IL, US
Assignee:
Cabot Microelectronics Corporation - Aurora IL
International Classification:
H01L 21/302
H01L 21/461
US Classification:
438689, 438691, 438692, 438693
Abstract:
The inventive method comprises chemically-mechanically polishing a substrate comprising at least one layer of silicon carbide with a polishing composition comprising a liquid carrier, an abrasive, and an oxidizing agent.

Composition And Method For Polishing A Sapphire Surface

US Patent:
2006019, Sep 7, 2006
Filed:
Mar 1, 2006
Appl. No.:
11/365155
Inventors:
Kevin Moeggenborg - Naperville IL, US
Isaac Cherian - Aurora IL, US
Mukesh Desai - Naperville IL, US
International Classification:
C03C 15/00
H01L 21/461
B44C 1/22
US Classification:
216088000, 216089000, 438692000
Abstract:
An improved composition and method for polishing a sapphire surface is disclosed. The method comprises abrading a sapphire surface, such as a C-plane or R-plane surface of a sapphire wafer, with a polishing slurry comprising an abrasive amount of an inorganic abrasive material such as colloidal silica suspended in an aqueous medium having a salt compound dissolved therein. The aqueous medium has a basic pH and includes the salt compound in an amount sufficient to enhance the sapphire removal rate relative to the rate achievable under the same polishing conditions using a the same inorganic abrasive in the absence of the salt compound.

Silicon Carbide Polishing Method Utilizing Water-Soluble Oxidizers

US Patent:
2008015, Jun 26, 2008
Filed:
Mar 5, 2008
Appl. No.:
12/042872
Inventors:
Mukesh Desai - Naperville IL, US
Kevin Moeggenborg - Naperville IL, US
Phillip Carter - Round Lake IL, US
Assignee:
Cabot Microelectronics Corporation - Aurora IL
International Classification:
H01L 21/302
US Classification:
438693, 257E21214
Abstract:
The inventive method comprises chemically-mechanically polishing a substrate comprising at least one layer of silicon carbide with a polishing composition comprising a liquid carrier, an abrasive, and an oxidizing agent.

Compositions, Methods And Systems For Polishing Aluminum Oxide And Aluminum Oxynitride Substrates

US Patent:
2008028, Nov 20, 2008
Filed:
May 26, 2006
Appl. No.:
11/442475
Inventors:
Kevin Moeggenborg - Naperville IL, US
Mukesh Desai - Naperville IL, US
International Classification:
C09K 13/00
C03C 15/00
H01L 21/302
US Classification:
216 88, 252 791, 438689
Abstract:
A method and system is provided for improved polishing or planarizing of aluminum oxide and/or aluminum oxynitride substrates. Specifically, the composition comprises an abrasive, a liquid carrier, and a phosphorus-type mono-acid. Preferably, the phosphorus-type mono-acid is phosphoric acid, phosphonoacetic acid, phosphorous acid, methyl phosphonic acid, or mixtures thereof. The control of the pH of the composition further improves polishing rates.

Possible Relatives

Daxa M Desai  Daksha A Desai  Aakash R Desai  Deepa A Desai  Deepak N Desai  Deepika H Desai  Darshak R Desai  Mukesh Singh  Mukesh B Patel  Mukesh Prasad 

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